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1. (WO2009129115) CYLINDRICAL MAGNETRON
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/129115    International Application No.:    PCT/US2009/040036
Publication Date: 22.10.2009 International Filing Date: 09.04.2009
IPC:
C23C 14/35 (2006.01)
Applicants: ANGSTROM SCIENCES, INC. [US/US]; 40 S. Linden Street Duquesne, PA 15110 (US) (For All Designated States Except US).
BERNICK, Mark, A. [US/US]; (US) (For US Only)
Inventors: BERNICK, Mark, A.; (US)
Agent: REZNICK, Paul, M.; (US).
FORTNEY, Lester, N.; (US).
WILLIAMS, Darrell, E.; (US).
BREAN, Daniel, H.; (US)
Priority Data:
61/124,087 14.04.2008 US
Title (EN) CYLINDRICAL MAGNETRON
(FR) MAGNÉTRON DE FORME CYLINDRIQUE
Abstract: front page image
(EN)A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch.
(FR)La présente invention concerne un dispositif de pulvérisation cathodique à magnétron rotatif de forme cylindrique comportant un corps cathodique définissant une enceinte de réception d’aimant et un ensemble de cible de forme cylindrique entourant le corps de cathode. L’ensemble de cible de forme cylindrique comporte un mandrin creux et une partie cible montée autour et espacé de la partie de mandrin creux pour créer un intervalle spatial entre le mandrin creux et la partie cible, l’intervalle spatial pouvant être compris entre 0,002 pouce et 0,020 pouce.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)