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1. (WO2009128855) GETTER FORMED BY LASER-TREATMENT AND METHODS OF MAKING SAME

Pub. No.:    WO/2009/128855    International Application No.:    PCT/US2008/075227
Publication Date: Oct 22, 2009 International Filing Date: Sep 4, 2008
IPC: H01L 23/26
B81B 7/00
Applicants: SIONYX, INC.
ALIE, Susan
Inventors: ALIE, Susan
Title: GETTER FORMED BY LASER-TREATMENT AND METHODS OF MAKING SAME
Abstract:
The present disclosure relates to methods of treating a silicon substrate with an ultra-fast laser to create a getter material for example in a substantially enclosed MEMS package. In an embodiment, the laser treating comprises irradiating the silicon surface with a plurality of laser pulses adding gettering microstructure to the treated surface. Semiconductor based packaged devices, e.g. MEMS, are given as examples hereof.