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Machine translation
1. (WO2009125914) TRANSPARENT FILM IMPARTING ANTIREFLECTIVE EFFECT TO SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/125914    International Application No.:    PCT/KR2009/000065
Publication Date: 15.10.2009 International Filing Date: 07.01.2009
IPC:
G02B 1/11 (2006.01)
Applicants: CHO, Keun Ho [KR/KR]; (KR) (For All Designated States Except US).
KUM, Byung Gon [KR/KR]; (KR) (For US Only).
PARK, Young Jun [KR/KR]; (KR) (For US Only).
PARK, Yoon Cheol [KR/KR]; (KR) (For US Only).
JANG, Hyun Myung [KR/KR]; (KR) (For US Only).
HEO, Soon Yeong [KR/KR]; (KR) (For US Only).
JEON, Jea Yong [KR/KR]; (KR) (For US Only)
Inventors: KUM, Byung Gon; (KR).
PARK, Young Jun; (KR).
PARK, Yoon Cheol; (KR).
JANG, Hyun Myung; (KR).
HEO, Soon Yeong; (KR).
JEON, Jea Yong; (KR)
Agent: SHINSEGI PATENT LAW FIRM; 3F., Yoong-Jun Bldg. 829-6 Yeoksam-dong, Gangnam-gu Seoul 135-936 (KR)
Priority Data:
10-2008-0033045 10.04.2008 KR
Title (EN) TRANSPARENT FILM IMPARTING ANTIREFLECTIVE EFFECT TO SUBSTRATE
(FR) FILM TRANSPARENT CONFÉRANT UN EFFET ANTI-REFLETS À UN SUBSTRAT
(KO) 기재에 반사방지 효과를 부여하는 투명 필름
Abstract: front page image
(EN)The present invention relates to a transparent film imparting an antireflective effect to a substrate. The disclosed film has pores of a micelle shape formed by surfactants. In addition, the transparent film is prepared by the following steps of: coating a heat-resistant transparent film with silica sol; baking the coated film at 80-150 ℃; and washing the surfactants and then drying the film. The silica sol comprises: an inorganic silica precursor having 3 or more of alkoxy groups or an organic-inorganic hybrid silica precursor; 0.0001-0.1 moles of cationic surfactants or anionic surfactants per 1 mole of the silica precursor; C1-5 lower alcohols; acids for controlling acid concentration; and water for balance. Accordingly, since a large-sized antireflective film can be massively produced through a roll-to-roll continuous process, the invention can provide an antireflective film which is produced through a simple process and reduces production costs.
(FR)L'invention concerne un film transparent conférant un effet anti-reflets à un substrat. Ce film, qui présente des pores en forme de micelle, est constitué de tensioactifs. En outre, ce film transparent est préparé selon un procédé comprenant les étapes consistant à : appliquer un sol de silice sur un film transparent thermorésistant; cuire le film ainsi revêtu entre 80 et 150 ℃; laver les tensioactifs; et sécher le film. Le sol de silice comprend: un précurseur de silice inorganique présentant au moins 3 groupes alkoxy ou un précurseur de silice hybride organique-inorganique; 0,0001 à 0,1 mole de tensioactifs cationiques ou anioniques par mole du précurseur de silice; des alcools inférieurs C1-5; des acides pour réguler la concentration en acides; le reste étant de l'eau. Ainsi, puisqu'il est possible de produire en masse un film anti-reflets de grande taille par un processus continu rouleau à rouleau, l'invention permet d'obtenir un film anti-reflets qui est produit par un procédé simple, avec de faible coûts de production.
(KO)본 발명은 기재에 반사방지 효과를 부여하는 투명 필름에 관한 것으로, 내열성 투명필름 상에 3개 이상의 알콕시 기를 갖는 무기 실리카 전구체 또는 유, 무기 혼성 실리카 전구체, 상기 실리카 전구체 1몰당 0.0001 내지 0.1 몰 비율의 양이온 계면활성제 또는 음이온 계면활성제, 탄소수 1 내지 5의 저급 알코올, 산농도 조절용 산과 잔량의 물로 이루어진 실리카 졸을 상기 내열성 투명 필름 위에 피복하고 80도 내지 150℃에서 베이킹한 후 상기 계면활성제를 세척하고 건조하여 제조되는 상기 계면활성제가 형성했던 미셀 형태의 기공을 갖고 기재에 반사방지 효과를 부여하는 투명 필름을 제공한다. 본 발명에 의하여, 롤투롤 방식의 연속공정으로 대면적의 반사방지 필름의 대량생산이 가능해져 공정이 단순하고 제조비가 저렴한 반사방지 필름이 제공된다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)