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1. (WO2009125867) STAGE DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/125867    International Application No.:    PCT/JP2009/057433
Publication Date: 15.10.2009 International Filing Date: 13.04.2009
IPC:
H01L 21/027 (2006.01), G03F 7/20 (2006.01), H01L 21/68 (2006.01)
Applicants: NIKON CORPORATION [JP/JP]; 12-1, Yurakucho 1-Chome, Chiyoda-ku, Tokyo 1008331 (JP) (For All Designated States Except US).
SHIBAZAKI, Yuichi [JP/JP]; (JP) (For US Only).
YOSHIMOTO, Hiromitsu [JP/JP]; (JP) (For US Only)
Inventors: SHIBAZAKI, Yuichi; (JP).
YOSHIMOTO, Hiromitsu; (JP)
Agent: SHIGA, Masatake; 1-9-2, Marunouchi Chiyoda-ku, Tokyo 1006620 (JP)
Priority Data:
2008-103737 11.04.2008 JP
Title (EN) STAGE DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
(FR) DISPOSITIF À ÉTAGE, APPAREIL D'EXPOSITION, ET PROCÉDÉ DE FABRICATION DU DISPOSITIF
(JA) ステージ装置、露光装置、及びデバイス製造方法
Abstract: front page image
(EN)Disclosed is an exposure apparatus comprising a movably arranged stage main body (27) which has a mounting surface (45a), and a correction mechanism (15) for correcting the shape of the mounting surface.
(FR)L'invention concerne un appareil d'exposition comportant un corps principal d'étage arrangé de manière mobile (27) ayant une surface de montage (45a), et un mécanisme de correction (15) permettant de corriger la forme de la surface de montage.
(JA) 露光装置は、移動可能に設けられ、載置面(45a)を有するステージ本体(27)と、前記載置面の形状を補正する補正機構(15)とを備える。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)