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1. (WO2009125802) EVAPORATION SOURCE AND FILM-FORMING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2009/125802 International Application No.: PCT/JP2009/057227
Publication Date: 15.10.2009 International Filing Date: 08.04.2009
IPC:
C23C 14/24 (2006.01) ,C23C 14/08 (2006.01) ,C23C 14/12 (2006.01) ,C23C 14/58 (2006.01)
Applicants: YAMAMOTO, Haruhiko[JP/JP]; JP (UsOnly)
KOKUBU, Kenjiro[JP/JP]; JP (UsOnly)
ULVAC, INC.[JP/JP]; 2500, Hagisono, Chigasaki-shi, Kanagawa 2538543, JP (AllExceptUS)
Inventors: YAMAMOTO, Haruhiko; JP
KOKUBU, Kenjiro; JP
Agent: ONDA, Hironori; 12-1, Ohmiya-cho 2-chome Gifu-shi, Gifu 5008731, JP
Priority Data:
2008-10160509.04.2008JP
Title (EN) EVAPORATION SOURCE AND FILM-FORMING DEVICE
(FR) SOURCE D'ÉVAPORATION ET DISPOSITIF DE FORMATION DE FILM
(JA) 蒸発源及び成膜装置
Abstract: front page image
(EN) Provided is an evaporation source (20) which improves the utilization efficiency of a film-forming material (29) without diminishing maintainability. The evaporation source (20) comprises: one tube-shaped peripheral wall (25) having a plurality of containment spaces (25S); and a plurality of dividing walls (27) that partition the area inside the peripheral wall (25) into the plurality of containment spaces. A plurality of holes (28) are formed in the peripheral wall (25) such that each containment space (25S) has at least one hole. The holes (28) connect the containment spaces (25S) with the outside so as to evaporate the film-forming material (29) stored in each containment space toward the outside.
(FR) L'invention propose une source d'évaporation (20) qui améliore le rendement d'utilisation d'un matériau (29) de formation de film sans réduire sa stabilité. La source d'évaporation (20) comprend : une paroi périphérique (25) en forme de tube qui présente plusieurs espaces de confinement (25S) et plusieurs parois de séparation (27) qui divisent en plusieurs espaces de confinement la zone située à l'intérieur de la paroi périphérique (25). Plusieurs trous (28) sont formés dans la paroi périphérique (25) de telle sorte que chaque espace de confinement (25S) présente au moins un trou. Les trous (28) relient les espaces de confinement (25S) à l'extérieur de manière à évaporer vers l'extérieur le matériau (29) de formation de film conservé dans chaque espace de confinement.
(JA)  メンテナンス性を損なうことなく、成膜材料(29)の利用効率を向上させた蒸発源(20)。蒸発源(20)は、複数の収容空間(25S)を有する管状の一つの周壁(25)と、周壁(25)の内部を該複数の収容空間に仕切る複数の隔壁部(27)と、を含む。周壁(25)には、収容空間(25S)ごとに少なくとも1つずつ配置される複数の孔(28)が形成されている。複数の孔(28)は、複数の収容空間(25S)の各々に収容された成膜材料(29)を各収容空間から外方へ向けて蒸発させるべく、複数の収容空間と外方とを連通する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)