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Machine translation
1. (WO2009125099) GLASS ETCHING COMPOSITION FREE FROM AMMONIUM IONS AND FROM DIFLUORIDE IONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/125099    International Application No.:    PCT/FR2009/050417
Publication Date: 15.10.2009 International Filing Date: 13.03.2009
IPC:
C03C 15/00 (2006.01)
Applicants: SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEPPIC [FR/FR]; 75 quai d'Orsay F-75007 Paris (FR) (For All Designated States Except US).
TROUVE, Gerard [FR/FR]; (FR) (For US Only).
BESSOLES, Yves [FR/FR]; (FR) (For US Only).
DE ROULHAC, Hughes Xavier [FR/FR]; (FR) (For US Only)
Inventors: TROUVE, Gerard; (FR).
BESSOLES, Yves; (FR).
DE ROULHAC, Hughes Xavier; (FR)
Agent: CONAN, Philippe; (FR)
Priority Data:
0852290 07.04.2008 FR
Title (EN) GLASS ETCHING COMPOSITION FREE FROM AMMONIUM IONS AND FROM DIFLUORIDE IONS
(FR) COMPOSITION DE DEPOLISSAGE DE VERRE EXEMPTE D'IONS AMMONIUM ET D'IONS BIFLUORURE
Abstract: front page image
(EN)Process for preparing a glass etching solution that is free from ammonium ions and from difluoride ions, that uses hydrofluoric acid and a composition that is free from ammonium ions and from difluoride ions comprising from 30% to 100%, preferably from 40% to 70%, by weight per 100% of the total weight of at least one soluble potassium salt and from 0% to 70%, preferably from 30% to 60%, by weight per 100% of the total weight of at least one inert filler.
(FR)Procédé de préparation d'une solution de dépolissage de verre exempte d'ions ammonium et d'ions bifluorure, mettant en oeuvre de l'acide f luorhydrique et une composition exempte d'ions ammonium et d'ions bifluorure comprenant de 30% à 100%, de préférence de 40% à 70%, massique pour 100% de la masse totale d'au moins un sel soluble de potassium et de 0% à 70%, de préférence de 30% à 60%, massique pour 100% de la masse totale d'au moins une charge inerte.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: French (FR)
Filing Language: French (FR)