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1. (WO2009123311) DIFFRACTION IMAGE CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/123311    International Application No.:    PCT/JP2009/056960
Publication Date: 08.10.2009 International Filing Date: 03.04.2009
IPC:
H01J 37/22 (2006.01), H01J 37/26 (2006.01), H01J 37/295 (2006.01)
Applicants: HITACHI, LTD. [JP/JP]; 6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo, 1008280 (JP) (For All Designated States Except US).
National University Corporation Hokkaido University [JP/JP]; 8, Kita 8-jyo Nishi 5-chome, Kita-ku, Sapporo-shi Hokkaido, 0600808 (JP) (For All Designated States Except US).
GOHARA, Kazutoshi; (For US Only).
DOBASHI, Takashi; (For US Only).
KOGUCHI, Masanari; (For US Only).
KAMIMURA, Osamu; (For US Only).
OHTA, Hiroya; (For US Only)
Inventors: GOHARA, Kazutoshi; .
DOBASHI, Takashi; .
KOGUCHI, Masanari; .
KAMIMURA, Osamu; .
OHTA, Hiroya;
Agent: HIRAKI, Yusuke; Kamiya-cho MT Bldg. 19F, 3-20, Toranomon 4-chome, Minato-ku, Tokyo, 1050001 (JP)
Priority Data:
2008-098562 04.04.2008 JP
Title (EN) DIFFRACTION IMAGE CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE
(FR) PROCÉDÉ DE CAPTURE D’IMAGE DE DIFFRACTION ET DISPOSITIF À FAISCEAU DE PARTICULES CHARGÉES
(JA) 回折像取得方法、及び荷電粒子線装置
Abstract: front page image
(EN)A charged particle beam microscope produces a diffraction image by parallel irradiating a sample (22) having a known structure with a charged particle beam and corrects the variation of the distance (L) dependent on the angle (ϑ) of diffraction between the sample and a detector by measuring the distance (r) reflecting the structure of the sample between the spots shown in the diffraction image. With this, the distortion varying with the off-axis distance from the optical axis shown in the diffraction image is corrected, and a high-accuracy structure analysis is achieved by accurately analyzing the positions of the spots shown in the diffraction image.
(FR)Un microscope à faisceau de particules chargées produit une image de diffraction en irradiant en parallèle un échantillon (22) qui présente une structure connue avec un faisceau de particules chargées, et corrige la variation de la distance (l) en fonction de l'angle de diffraction (θ) entre l'échantillon et un détecteur en mesurant la distance (r) réfléchissant la structure de l'échantillon entre les taches visibles dans l'image de diffraction. Grâce à cela, la distorsion qui varie avec la distance en dehors de l'axe à partir de l'axe optique visible dans l'image de diffraction, est corrigée, et une analyse de structure de grande précision est réalisée en analysant de manière précise les positions des taches visibles dans l'image de diffraction.
(JA) 本発明の荷電粒子線顕微装置は、既知の構造を持つ試料(22)に荷電粒子線を平行に照射して得られる回折像において、試料の構造を反映した回折像のスポット間距離(r)を測定して、回折角度(θ)に依存した試料と検出器間の距離(L)の変化を補正する。 これにより、回折像において光軸からの離軸距離で変化する歪みを補正でき、回折像のスポット位置の正確な解析を行うことにより精度の高い構造解析が可能となった。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)