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Machine translation
1. (WO2009119983) FPD SUBSTRATE AND SEMICONDUCTOR WAFER INSPECTION SYSTEM USING DUPLICATE IMAGES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/119983    International Application No.:    PCT/KR2009/001234
Publication Date: 01.10.2009 International Filing Date: 12.03.2009
IPC:
H01L 21/66 (2006.01)
Applicants: WISEPLANET CO.,LTD. [KR/KR]; 714 Gwanpyeong-dong, Yuseong-gu Daejeon 305-509 (KR) (For All Designated States Except US).
HONG, Ki-Hyun [KR/KR]; (KR) (For US Only).
NA, Sang-Chan [KR/KR]; (KR) (For US Only).
KIM, Tae-Hong [KR/KR]; (KR) (For US Only)
Inventors: HONG, Ki-Hyun; (KR).
NA, Sang-Chan; (KR).
KIM, Tae-Hong; (KR)
Agent: KANG, Kyung Chan; (KR).
BYUN, Chang-Kyu; (KR)
Priority Data:
10-2008-0029120 28.03.2008 KR
Title (EN) FPD SUBSTRATE AND SEMICONDUCTOR WAFER INSPECTION SYSTEM USING DUPLICATE IMAGES
(FR) SYSTÈME DE VÉRIFICATION D'UN SUBSTRAT FPD ET DE TRANCHES À SEMI-CONDUCTEURS UTILISANT DES IMAGES DUPLIQUÉES
(KO) 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼 검사시스템
Abstract: front page image
(EN)The present invention relates to an FPD substrate and semiconductor wafer inspection system using duplicate images. More particularly, the present invention relates to an FPD substrate and semiconductor wafer inspection system using duplicate images capable of acquiring two or more duplicated images through a single scanning of the particles adhered to a flat panel display, existing on a surface of the flat panel display and projected from the surface of the flat panel display. The present invention has advantages in that most of the defects and foreign substances can be detected by the types thereof through a single inspection.
(FR)La présente invention concerne un système de vérification d'un substrat FPD et de tranches à semi-conducteurs utilisant des images dupliquées. Elle concerne plus particulièrement un système de vérification d'un substrat FPD et de tranches à semi-conducteurs utilisant des images dupliquées, qui peut acquérir au moins deux images dupliquées par simple balayage des particules qui sont incrustées sur un écran plat, qui sont présentes sur une surface de l'écran plat, et qui sont projetées de la surface de l'écran plat. Le système de l'invention présente l'avantage que la plupart des défauts et des substances étrangères peuvent être détectés grâce à leurs types, par simple vérification.
(KO)본 발명은 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼 검사시스템에 관한 것으로서, 더욱 상세하게는 평판 디스플레이 패널에 묻혀있는 파티클 혹은 표면에 존재하는 파티클 및 돌출된 파티클의 존재 유무를 한 번의 스캔으로 두 개 또는 그 이상의 이미지를 중복하여 획득함으로써, 한 번의 검사만으로 대부분의 결함 및 이물을 종류별로 검출할 수 있는 중복 영상을 이용한 에프피디 기판 및 반도체 웨이퍼 검사시스템에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)