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Machine translation
1. (WO2009118083) COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2009/118083 International Application No.: PCT/EP2009/001465
Publication Date: 01.10.2009 International Filing Date: 02.03.2009
IPC:
C23C 18/12 (2006.01)
Applicants: STOCKUM, Werner[DE/DE]; DE (UsOnly)
KOEHLER, Ingo[DE/DE]; DE (UsOnly)
MEIJER, Arjan[NL/DE]; DE (UsOnly)
BROOKES, Paul Craig[GB/GB]; GB (UsOnly)
PATTERSON, Katie[GB/GB]; GB (UsOnly)
JAMES, Mark[GB/GB]; GB (UsOnly)
MERCK PATENT GMBH[DE/DE]; Frankfurter Strasse 250 64293 Darmstadt, DE (AllExceptUS)
Inventors: STOCKUM, Werner; DE
KOEHLER, Ingo; DE
MEIJER, Arjan; DE
BROOKES, Paul Craig; GB
PATTERSON, Katie; GB
JAMES, Mark; GB
Agent: MERCK PATENT GMBH; Frankfurter Straße 250 64293 Darmstadt, DE
Priority Data:
08005635.126.03.2008EP
08015460.202.09.2008EP
Title (EN) COMPOSITION FOR MANUFACTURING SIO2 RESIST LAYERS AND METHOD OF ITS USE
(FR) COMPOSITION DE FABRICATION DE COUCHES PROTECTRICES AU SIO2 ET SON PROCÉDÉ D’UTILISATION
Abstract:
(EN) The present invention relates to compositions, which are useful for the generation of patterned or structured SiO2-layers or of SiO2-lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions.
(FR) La présente invention concerne des compositions qui sont utiles pour la génération de couches de SiO2 structurées ou à motif ou de lignes de SiO2 pendant le processus de fabrication de dispositifs semi-conducteurs, et qui conviennent à l’application dans les opérations à jet d’encre. La présente invention concerne aussi un procédé modifié de fabrication de dispositifs semi-conducteurs tirant avantage de ces nouvelles compositions.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)