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Machine translation
1. (WO2009067100) ORGANOSILICONE COMPOSITIONS AND METHODS FOR PREPARING THEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/067100    International Application No.:    PCT/US2007/024298
Publication Date: 28.05.2009 International Filing Date: 21.11.2007
IPC:
C08G 77/50 (2006.01), C08L 83/14 (2006.01), C09D 183/14 (2006.01)
Applicants: MOMENTIVE PERFORMANCE MATERIALS INC. [US/US]; 187 Danbury Road, Wilton, CT 05897 (US) (For All Designated States Except US).
NESAKUMAR, Edward, Joseph [IN/IN]; (IN).
KUNNAN, Ganesh [IN/US]; (US).
KUMAR, Vikram [IN/IN]; (IN).
LEATHERMAN, Mark, D. [US/US]; (US).
RAJARAMAN, Suresh, K. [IN/US]; (US).
RAMALINGAM, Hariharan [IN/IN]; (IN)
Inventors: NESAKUMAR, Edward, Joseph; (IN).
KUNNAN, Ganesh; (US).
KUMAR, Vikram; (IN).
LEATHERMAN, Mark, D.; (US).
RAJARAMAN, Suresh, K.; (US).
RAMALINGAM, Hariharan; (IN)
Agent: WHEELOCK, Kenneth, S.; Momentive Performance Materials Inc., One Plastics Avenue, Bldg. 51, Pittsfield, MA 01201 (US)
Priority Data:
Title (EN) ORGANOSILICONE COMPOSITIONS AND METHODS FOR PREPARING THEM
(FR) COMPOSITIONS D'ORGANOSILICONE ET PROCÉDÉS POUR LES PRÉPARER
Abstract: front page image
(EN)Disclosed herein is a composition comprising a structure (M1)a(ME)b,(D1)c(D2)d(T)e(Q)f, wherein M1 = R1R2R3SiO1/2; ME = R4R5RESiO1/2; D1 = R6R7SiO2/2; D2 = R8R9SiO2/2; T = R10SiO3/2; and Q = SiO4/2; wherein each RE is independently a monovalent hydrocarbon radical containing an epoxy group; R9 comprises a structure -L1- Si(R11)g (OR12)3-g or L2(D3)h(M2)j-L3-Si(R13)g(OR14)3-g wherein L1, L2, and L3 are independently divalent linking groups; g and g' independently have a value from O to 2; M2 = R15R16R17SiO1/2; D3 = R18R19SiO2/2; wherein R1, R2, R3, R4, R5, R6, R7, R8, R10, R1 1, R12, R13, R14, R15, R16, R17, R18, and R19 are independently monovalent hydrocarbon radicals; wherein a, b, c, d, e, f, h, and i are stoichiometric subscripts that are zero or positive subject to the following limitations: b has a value of 2; d is greater than or equal to 1; when (a + c + e + f) is equal to zero, (b + d) is greater than or equal to 3; and when i = O, h is at least 1.
(FR)L'invention concerne une composition comprenant une structure (M')a(M%,(D V^ )d(T)e(Q)f, dans laquelle M1 = R1R2R3SiO1Z2; ME = R4R5RESi0,/2; D1 = R6R7SiO272; D2 = R8R9SiO272; T = R10SiO372; et Q = SiO472; dans laquelle chaque RE représente indépendamment un radical hydrocarboné monovalent contenant un groupe époxy; R9 comprend une structure -i&Lgr;SiCR' VOR12^ ou L2(D3)h(M2)j-L3-Si(R13)g<OR14)3-g>, dans laquelle L1, L2, et L3 représentent indépendamment des groupes de liaison divalents; g et g' ont indépendamment une valeur de 0 à 2; M2 = R15R16R17SiOi72; D3 = R18R19SiO272; dans laquelle R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, R12, R13, R14, R15, R16, R17, R18, et R1 représentent indépendamment des radicaux hydrocarbonés monovalents; dans laquelle a, b, c, d, e, f, h, et i sont des indices stoéchiométriques, qui valent zéro ou un nombre positif, soumis aux restrictions suivantes : b a une valeur de 2; d est supérieur ou égal à 1; lorsque (a + c + e + f) est égal à zéro, (b + d) est supérieur ou égal à 3; et lorsque i = 0, h vaut au moins 1.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)