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Machine translation
1. (WO2009066997) CONTACT ETCH FOR AMS PRODUCTS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/066997    International Application No.:    PCT/MY2008/000163
Publication Date: 28.05.2009 International Filing Date: 24.11.2008
IPC:
H01L 21/3205 (2006.01), H01L 21/461 (2006.01), H01L 21/18 (2006.01)
Applicants: MIMOS BERHAD [MY/MY]; Technology Park Malaysia, Bukit Jalil, 57000 Kuala Lumpur (MY) (For All Designated States Except US).
BUYONG, Muhamad, Ramdzan [MY/MY]; (MY) (For US Only)
Inventors: BUYONG, Muhamad, Ramdzan; (MY)
Agent: SIAW, Timothy; Shearn Delamore & Co., 7th Floor, Wisma Hamzah-Kwong Hing, No. 1, Leboh Ampang, Kuala Lumpur 50100 (MY)
Priority Data:
PI 20072068 22.11.2007 MY
Title (EN) CONTACT ETCH FOR AMS PRODUCTS
(FR) GRAVURE DE CONTACT POUR PRODUITS AMS
Abstract: front page image
(EN)This invention provides a method to improve metal step coverage in contact hole filling by utilizing two step contact etch. The contact etch process provides a semi-rounded profile on the top half of the contact hole and a straight profile at the lower half. The semi-rounded contact etch process is able to reduce the aspect ratio to 1.
(FR)La présente invention propose un procédé d'amélioration de l'étape de recouvrement par métal dans le remplissage de trous de contact en ayant recours à une gravure de contact en deux étapes. L'opération de gravure de contact forme un profil semi-arrondi sur la moitié supérieure du trou de contact et un profil rectiligne sur la moitié inférieure. L'opération de gravure de contact semi-arrondi permet de réduire à 1 le rapport d'allongement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)