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Machine translation
1. (WO2009064870) SELECTIVE EMITTER AND TEXTURE PROCESSES FOR BACK CONTACT SOLAR CELLS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/064870    International Application No.:    PCT/US2008/083385
Publication Date: 22.05.2009 International Filing Date: 13.11.2008
IPC:
H01L 31/042 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US) (For All Designated States Except US).
DOMINGUEZ, Jason [US/US]; (US) (For US Only).
HACKE, Peter [US/US]; (US) (For US Only).
CUMMINGS, Damion [US/US]; (US) (For US Only)
Inventors: DOMINGUEZ, Jason; (US).
HACKE, Peter; (US).
CUMMINGS, Damion; (US)
Agent: PATTERSON, Todd, B.; Patterson & Sheridan, L.L.P. 3040 Post Oak Blvd. Suite 1500 Houston, TX 77056-6582 (US)
Priority Data:
60/987,554 13.11.2007 US
Title (EN) SELECTIVE EMITTER AND TEXTURE PROCESSES FOR BACK CONTACT SOLAR CELLS
(FR) PROCÉDÉS DE FABRICATION DE PHOTOPILES À CONTACT ARRIÈRE DU TYPE À TEXTURE ET ÉMETTEUR SÉLECTIF
Abstract: front page image
(EN)Methods for manufacturing textured selective emitter back contact solar cells, and solar cells made in accordance therewith. A separate antireflective coating is preferably deposited, which also preferably provides simultaneous hydrogen passivation. The high sheet resistance and low sheet resistance selective emitter diffusions may be performed in either order.
(FR)Procédés de fabrication de photopiles à contact arrière du type à texture et émetteur sélectif, et photopiles résultantes. De préférence, on dépose un revêtement antiréfléchissant, qui assure de préférence également la passivation d'hydrogène simultanée. On peut assurer dans un ordre indifférent des diffusions par émetteur sélectif à résistance de couche élevée et faible
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)