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1. (WO2009064365) COMPOSITIONS AND METHODS FOR RUTHENIUM AND TANTALUM BARRIER CMP
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/064365    International Application No.:    PCT/US2008/012564
Publication Date: 22.05.2009 International Filing Date: 07.11.2008
IPC:
C09K 3/14 (2006.01)
Applicants: CABOT MICROELECTRONICS CORPORATION [US/US]; Legal Department, 870 North Commons Drive, Aurora, Illinois 60504 (US) (For All Designated States Except US)
Inventors: LI, Shoutian; (US)
Agent: WESEMAN, Steven; Associate General Counsel, Intellectual Property, Cabot Microelectronics Corporation, 870 North Commons Drive, Aurora, Illinois 60504 (US)
Priority Data:
11/937,804 09.11.2007 US
Title (EN) COMPOSITIONS AND METHODS FOR RUTHENIUM AND TANTALUM BARRIER CMP
(FR) COMPOSITIONS ET PROCÉDÉS POUR LE POLISSAGE CHIMIO-MÉCANIQUE DE BARRIÈRE DE RUTHÉNIUM ET DE TANTALE
Abstract: front page image
(EN)This invention provides a chemical-mechanical polishing composition comprising an abrasive, an aqueous carrier, an oxidizing agent having a standard reduction potential of greater than 0.7 V and less than 1.3 V relative to a standard hydrogen electrode, and optionally a source of borate anions, with the proviso that when the oxidizing agent comprises a peroxide other than perborate, perphosphate, or percarbonate, the chemical-mechanical polishing composition further comprises a source of borate anions, wherein the pH of the chemical-mechanical polishing composition is between 7 and 12. The invention also provides a method of polishing a substrate with the aforementioned chemical-mechanical polishing composition.
(FR)Cette invention porte sur une composition de polissage chimio-mécanique comprenant un abrasif, un véhicule aqueux, un agent oxydant ayant un potentiel de réduction standard de plus de 0,7 V et de moins de 1,3 V par rapport à une électrode standard à hydrogène, et facultativement une source d'anions borates, à la condition que, lorsque l'agent oxydant comprend un peroxyde autre que le perborate, le perphosphate ou le percarbonate, la composition de polissage chimio-mécanique comprenne en outre une source d'anions borates, le pH de la composition de polissage chimio-mécanique étant entre 7 et 12. L'invention porte également sur un procédé de polissage d'un substrat avec la composition de polissage chimio-mécanique précitée.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)