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Pub. No.:    WO/2009/064102    International Application No.:    PCT/KR2008/006640
Publication Date: 22.05.2009 International Filing Date: 11.11.2008
G01B 11/06 (2006.01)
Applicants: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE [KR/KR]; 1, Doryong-dong, Yuseong-gu, Daejeon 305-340 (KR) (For All Designated States Except US).
CHO, Yong Jai [KR/KR]; (KR) (For US Only).
CHEGAL, Won [KR/KR]; (KR) (For US Only).
CHO, Hyun Mo [KR/KR]; (KR) (For US Only)
Inventors: CHO, Yong Jai; (KR).
CHEGAL, Won; (KR).
CHO, Hyun Mo; (KR)
Agent: KWON, Oh-Sig; 4F, Jooeunleaderstel, 921, Dunsan-dong, Seo-gu, Daejeon 302-120 (KR)
Priority Data:
10-2007-0115398 13.11.2007 KR
Abstract: front page image
(EN)The present invention relates to a single-polarizer focused-beam ellipsometer, and more particularly, to a focused-beam ellipsometer having a simplified structure in which a single polarizing beam splitter plays roles as a polarization generator, a beam splitter and a polarization analyzer. A measuring method is employed in which a multiple incidence plane measurement method is applied to multiple angles of incidence, and thus it is possible to analyze exact information for optical properties of the specimen, i.e., in the case of a thin film, thickness and refractive index of the thin film.
(FR)L'invention concerne un ellipsomètre à faisceau concentré et polariseur unique, et plus précisément, un ellipsomètre à faisceau concentré possédant une structure simplifiée dans laquelle le diviseur de faisceau à polariseur unique joue le rôle de générateur de polarisation, de diviseur de faisceau et d'analyseur de polarisation. Un procédé de mesure est utilisé dans lequel un procédé de mesure de plans d'incidence multiples est appliqué à des angles multiples d'incidence, rendant ainsi possible l'analyse des informations exactes des propriétés optiques de l'échantillon, par exemple, dans le cas d'un film mince, l'épaisseur et l'indice de réfraction dudit film.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Korean (KO)