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1. (WO2009062606) LITHOGRAPHIC APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/062606    International Application No.:    PCT/EP2008/009240
Publication Date: 22.05.2009 International Filing Date: 03.11.2008
IPC:
F16F 9/06 (2006.01), G02B 7/02 (2006.01), G03F 7/20 (2006.01)
Applicants: ASML HOLDING N.V. [NL/NL]; De Run 6501, NL-5504 DR Veldhoven (NL) (For All Designated States Except US).
FARNSWORTH, Windy, Lynn [US/US]; (US) (For US Only).
DEL PUERTO, Santiago [US/US]; (US) (For US Only).
NAYFEH, Samir A. [US/US]; (US) (For US Only)
Inventors: FARNSWORTH, Windy, Lynn; (US).
DEL PUERTO, Santiago; (US).
NAYFEH, Samir A.; (US)
Agent: VAN DEN HOOVEN, Jan; ASML Corporate Intellectual Property, P.O. Box 324, NL-5500 AH Veldhoven (NL)
Priority Data:
60/988,341 15.11.2007 US
Title (EN) LITHOGRAPHIC APPARATUS
(FR) APPAREIL LITHOGRAPHIQUE
Abstract: front page image
(EN)In a lithographic apparatus, dampers (63, 64, 65) are provided that may be used within mounts for optical elements (60) in order to damp the motion of the optical element relative to the component to which it is mounted.
(FR)Selon l'invention, dans un appareil lithographique, des amortisseurs (63, 64, 65) sont prévus, lesquels peuvent être utilisés à l'intérieur de montures pour des éléments optiques (60) afin d'amortir le mouvement de l'élément optique par rapport au composant sur lequel il est monté.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)