WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |

Search International and National Patent Collections
World Intellectual Property Organization
Machine translation
1. (WO2009060769) ASHING SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/060769    International Application No.:    PCT/JP2008/069681
Publication Date: 14.05.2009 International Filing Date: 29.10.2008
H01L 21/3065 (2006.01)
Applicants: ULVAC, INC. [JP/JP]; 2500, Hagisono, Chigasaki-shi, Kanagawa 2538543 (JP) (For All Designated States Except US).
UEDA, Masahisa [JP/JP]; (JP) (For US Only).
KURIMOTO, Takashi [JP/JP]; (JP) (For US Only).
NAKAMURA, Kyuzo [JP/JP]; (JP) (For US Only).
SUU, Koukou [JP/JP]; (JP) (For US Only).
YOGO, Toshiya [JP/JP]; (JP) (For US Only).
KOMATSU, Kazushige [JP/JP]; (JP) (For US Only).
TACHIBANA, Nobusuke [JP/JP]; (JP) (For US Only)
Inventors: UEDA, Masahisa; (JP).
KURIMOTO, Takashi; (JP).
NAKAMURA, Kyuzo; (JP).
SUU, Koukou; (JP).
YOGO, Toshiya; (JP).
KOMATSU, Kazushige; (JP).
TACHIBANA, Nobusuke; (JP)
Agent: ONDA, Hironori; 12-1, Ohmiya-cho 2-chome, Gifu-shi, Gifu 5008731 (JP)
Priority Data:
2007-287341 05.11.2007 JP
(JA) アッシング装置
Abstract: front page image
(EN)An ashing system wherein variations in ashing rate over time are suppressed. The ashing system performing ashing of an organic material on a substrate (W) including an exposed metal in a processing chamber (11) includes a passage formed in the processing chamber (11) in which passage an active species supplied to the processing chamber (11) passes through. The passage is formed such that the same metal as the one scattered from the substrate (W) by the active species is exposed to the surfaces (11a; 31a; 33a; 33b) defining the passage and to which the metal scattered from the substrate (W) adheres.
(FR)Système d'incinération permettant de contrecarrer les variations de la vitesse d'incinération en fonction du temps. Le système d'incinération, qui réalise l'incinération d'un matériau organique sur un substrat (W) comprenant un métal exposé dans une chambre (11) de traitement, comprend un passage formé dans la chambre (11) de traitement, ledit passage étant traversé par une espèce active amenée dans la chambre (11) de traitement. Le passage est formé de telle sorte que le même métal que celui dispersé à partir du substrat (W) par l'espèce active soit exposé aux surfaces (11a; 31a; 33a; 33b) définissant le passage, auxquelles le métal dispersé à partir du substrat (W) adhère.
(JA) アッシングレートの経時変化を抑制するアッシング装置。露出金属を含む基板(W)上の有機材料を処理室(11)内にてアッシングするアッシング装置は、処理室(11)内に形成され、該処理室(11)に供給された活性種が通過する経路を含む。この経路は、該経路を画定する面であって、活性種によって基板(W)から飛散する前記金属が付着し得る面(11a;31a;33a;33b)に、前記金属と同一の金属が露出されるように形成されている。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)