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Machine translation
1. (WO2009059238) PLASMA TREATMENT BETWEEN DEPOSITION PROCESSES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/059238    International Application No.:    PCT/US2008/082135
Publication Date: 07.05.2009 International Filing Date: 31.10.2008
IPC:
H01L 21/205 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue, Santa Clara, California 95054 (US) (For All Designated States Except US).
CHOI, Soo Young [KR/US]; (US) (For US Only).
CHAE, Yong Kee [KR/US]; (US) (For US Only).
SHENG, Shuran [CA/US]; (US) (For US Only).
LI, Liwei [CN/US]; (US) (For US Only)
Inventors: CHOI, Soo Young; (US).
CHAE, Yong Kee; (US).
SHENG, Shuran; (US).
LI, Liwei; (US)
Agent: PATTERSON, B. Todd; Patterson & Sheridan, L.L.P., 3040 Post Oak Blvd., Suite 1500, Houston, Texas 77056-6582 (US)
Priority Data:
60/985,194 02.11.2007 US
Title (EN) PLASMA TREATMENT BETWEEN DEPOSITION PROCESSES
(FR) TRAITEMENT AU PLASMA ENTRE DES PROCÉDÉS DE DÉPÔT
Abstract: front page image
(EN)Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.
(FR)Les modes de réalisation de la présente invention comprennent un procédé amélioré de formation d'une pile solaire à films minces en utilisant un traitement au plasma entre deux étapes de dépôt ou plus. Les modes de réalisation de l'invention prévoient également au sens général un procédé et un appareil de formation de celle-ci. La présente invention peut être utilisée avantageusement pour former d'autres piles solaires à jonction unique, à jonction tandem, ou à jonctions multiples.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)