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Pub. No.:    WO/2009/057452    International Application No.:    PCT/JP2008/068709
Publication Date: 07.05.2009 International Filing Date: 16.10.2008
C07C 69/54 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 (JP) (For All Designated States Except US).
FUJITA, Akinori [JP/JP]; (JP) (For US Only)
Inventors: FUJITA, Akinori; (JP)
Agent: SIKs & Co.; 8th Floor, Kyobashi-Nisshoku Bldg. 8-7, Kyobashi 1-chome Chuo-ku, Tokyo 1040031 (JP)
Priority Data:
2007-286438 02.11.2007 JP
(JA) (メタ)アクリレート化合物
Abstract: front page image
(EN)Disclosed is a novel (meth)acrylate compound. Specifically disclosed is a (meth)acrylate compound represented by the following general formula (1). (In the general formula (1), R1 and R2 independently represent a hydrogen atom or a methyl group; X represents a trivalent or higher-valent polyhydric alcohol or an organic group residue derived from a hydroxybenzene; and m and n each represents an integer not less than 1, with m + n being not less than 3.)
(FR)L'invention concerne un nouveau composé (méth)acrylate. L'invention concerne spécificiquement un composé (méth)acrylate représenté par la formule générale (1) suivante. (Dans la formule générale (1), R1 et R2 représentent indépendamment un atome d'hydrogène ou un groupe méthyle ; X représente un alcool polyhydrique trivalent ou d'une valence supérieure ou un résidu de groupe organique dérivé d'un hydroxybenzène ; et m et n représentent chacun un entier supérieur ou égal à 1, m + n étant supérieur ou égal à 3.)
(JA) 新規(メタ)アクリレート化合物を提供する。  下記一般式(1)で示される(メタ)アクリレート化合物。 (一般式(1)中、R1およびR2はそれぞれ独立に水素原子またはメチル基を表し、Xは3価以上の多価アルコールまたはヒドロキシベンゼン由来の有機基残基を表し、mおよびnはそれぞれ1以上の整数を表し、かつ、m+nが3以上である。)
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)