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1. (WO2009057010) MULTILAYER STRUCTURE AND METHOD OF PRODUCING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2009/057010    International Application No.:    PCT/IB2008/054302
Publication Date: 07.05.2009 International Filing Date: 20.10.2008
IPC:
H01L 21/02 (2006.01), G06F 17/50 (2006.01)
Applicants: IPDIA [FR/FR]; 2, rue de la Girafe F-14000 Caen (FR) (For All Designated States Except US).
TESSON, Olivier [FR/FR]; (For US Only).
LECORNEC, Francois [FR/FR]; (For US Only)
Inventors: TESSON, Olivier; .
LECORNEC, Francois;
Agent: VIGNESOULT, Serge; Cabinet Plasseraud 52, rue de la Victoire F-75440 Paris Cedex 09 (FR)
Priority Data:
07119859.2 02.11.2007 EP
Title (EN) MULTILAYER STRUCTURE AND METHOD OF PRODUCING THE SAME
(FR) STRUCTURE MULTICOUCHE ET SON PROCÉDÉ DE PRODUCTION
Abstract: front page image
(EN)A multilayer structure, in particular a trench capacitor, is provided comprising a patterned layer structure comprising trenches, and a first electrode, wherein the patterned layer structure comprises a FASS-curve structure, and wherein at least parts of the first electrode are formed on the FASS-curve structure.
(FR)La présente invention concerne une structure multicouche, notamment un condensateur en tranchée, dotée d'une structure de couches à motif comprenant des tranchées, ainsi qu'une première électrode. La structure de couches à motif comprend une structure à courbe FASS. Au moins des parties de la première électrode sont formées sur la structure de courbe FASS.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)