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1. WO2009046895 - MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Publication Number WO/2009/046895
Publication Date 16.04.2009
International Application No. PCT/EP2008/008251
International Filing Date 29.09.2008
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70308
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70308Optical correction elements, filters and phase plates for manipulating, e.g. intensity, wavelength, polarization, phase, image shift
G03F 7/70891
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70883of optical system
70891Temperature
Applicants
  • CARL ZEISS SMT AG [DE]/[DE] (AllExceptUS)
  • DODOC, Aurelian [DE]/[DE] (UsOnly)
  • BLEIDISTEL, Sascha [DE]/[DE] (UsOnly)
  • CONRADI, Olaf [DE]/[DE] (UsOnly)
  • KAZI, Arif [DE]/[DE] (UsOnly)
Inventors
  • DODOC, Aurelian
  • BLEIDISTEL, Sascha
  • CONRADI, Olaf
  • KAZI, Arif
Agents
  • SCHWANHÄUSSER, Gernot
Priority Data
07019674.609.10.2007EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
(FR) APPAREIL D'EXPOSITION PAR PROJECTION MICROLITHOGRAPHIQUE
Abstract
(EN)
A microlithographic projection exposure apparatus (10) comprises a primary illumination system (12) producing projection light, a projection objective (20; 120) and a correction optical system. The latter comprises a secondary illumination system (30; 130), which produces an intensity distribution of correction light in a reference surface (48; 148), and a correction element (32; 132) which includes a heating material and is arranged in a plane (38; 174) being at least substantially optically conjugate to the reference surface (48; 148) such that the correction light and the projection light pass through at least one lens contained in the projection objective (20; 120) before they impinge on the correction element (32; 132). All lenses (34; L1 to L5) through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
(FR)
L'invention porte sur un appareil d'exposition par projection microlithographique (10) qui comprend un système d'éclairage primaire (12) produisant une lumière de projection, un objectif de projection (20; 120) et un système optique de correction. Ce dernier comprend un système d'éclairage secondaire (30; 130) qui produit une distribution d'intensité de lumière de correction dans une surface de référence (48; 148), et un élément de correction (32; 132) qui comprend un matériau de chauffage et est disposé dans un plan (38; 174) qui est au moins sensiblement optiquement conjugué à la surface de référence (48; 148), de telle sorte que la lumière de correction et la lumière de projection passent à travers au moins une lentille contenue dans l'objectif de projection (20; 120) avant leur impact sur l'élément de correction (32; 132). Toutes les lentilles (34; L1 à L5) à travers lesquelles à la fois la lumière de correction et la lumière de projection passent sont faites d'un matériau de lentille qui a un coefficient d'absorption pour la lumière de correction inférieur à celui du matériau de chauffage contenu dans l'élément de correction.
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