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1. (WO2008146819) EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING DEVICE, CLEANING METHOD AND EXPOSURE METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2008/146819 International Application No.: PCT/JP2008/059744
Publication Date: 04.12.2008 International Filing Date: 27.05.2008
IPC:
H01L 21/027 (2006.01) ,G03F 7/20 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 〒1008331 東京都千代田区丸の内三丁目2番3号 Tokyo 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008331, JP (AllExceptUS)
長坂 博之 NAGASAKA, Hiroyuki [JP/JP]; JP (UsOnly)
依田 安史 YODA, Yasushi [JP/JP]; JP (UsOnly)
Inventors:
長坂 博之 NAGASAKA, Hiroyuki; JP
依田 安史 YODA, Yasushi; JP
Agent:
川北 喜十郎 KAWAKITA, Kijuro; 〒1600022 東京都新宿区新宿一丁目5番4号 YKBマイクガーデン Tokyo YKB Mike Garden 5-4, Shinjuku 1-chome Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2007-14047428.05.2007JP
2007-17721705.07.2007JP
Title (EN) EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING DEVICE, CLEANING METHOD AND EXPOSURE METHOD
(FR) DISPOSITIF D'EXPOSITION, PROCÉDÉ DE FABRICATION DE CE DISPOSITIF, DISPOSITIF DE NETTOYAGE, PROCÉDÉ DE NETTOYAGE ET PROCÉDÉ D'EXPOSITION
(JA) 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
Abstract:
(EN) Disclosed is an exposure apparatus (EX) wherein a substrate (P) is exposed to an exposure light (EL) through a liquid (LQ) for exposure. This exposure apparatus (EX) comprises an optical device (11) emitting an exposure light, a stage (2, 32) movable on the light emission side of the optical device (11), a certain member (150 (C)) mounted on the stage, and a vibration generator (10) which applies vibrations to a liquid in an immersion space, which is formed on the certain member, by vibrating the certain member. Also disclosed is a cleaning device used for an liquid immersion exposure apparatus. In this exposure apparatus (EX), performance deterioration due to contamination can be suppressed.
(FR) L'invention concerne un dispositif d'exposition (EX) dans lequel un substrat (P) est exposé à une lumière d'exposition (EL) à travers un liquide (LQ) en vue de son exposition. Ce dispositif d'exposition (EX) comprend un dispositif optique (11) émettant une lumière d'exposition, un étage (2, 32) mobile du côté d'émission de lumière du dispositif optique (11), un certain élément (150 (C)) monté sur cet étage, et un générateur de vibrations (10) qui exerce des vibrations sur un liquide dans un espace d'immersion, formé sur le certain élément, en faisant vibrer ce dernier. L'invention concerne également un dispositif de nettoyage utilisé pour ce dispositif d'exposition par immersion dans un liquide. Ce dispositif d'exposition (EX) permet d'éviter toute détérioration des performances due à la contamination.
(JA)  露光装置EXは、露光用液体LQを介して露光光ELで基板Pを露光する。露光装置EXは、露光光を射出する光学素子11と、光学素子11の射出側で移動可能なステージ2,32と、ステージに搭載された所定部材150(C)と、所定部材を振動させることによって所定部材上に形成されている液浸空間の液体に振動を与える振動発生装置(10)とを備える。液浸露光装置に用いられる洗浄装置もまた提供される。汚染に起因する性能の劣化を抑制できる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)
Also published as:
KR1020100031694