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1. (WO2008101664) OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/101664    International Application No.:    PCT/EP2008/001278
Publication Date: 28.08.2008 International Filing Date: 19.02.2008
IPC:
G02B 17/06 (2006.01), G03F 7/20 (2006.01)
Applicants: CARL ZEISS SMT AG [DE/DE]; Rudolf-Eber-Strasse 2, 73447 Oberkochen (DE) (For All Designated States Except US).
DINGER, Udo [DE/DE]; (DE) (For US Only)
Inventors: DINGER, Udo; (DE)
Agent: SAWODNY, Michael; Dreiköniggasse 10, 89073 Ulm (DE)
Priority Data:
10 2007 0008 702.2 20.02.2007 DE
60/902,234 20.02.2007 US
Title (EN) OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES
(FR) ÉLÉMENT OPTIQUE AVEC SOURCES LUMINEUSES PRIMAIRES MULTIPLES
Abstract: front page image
(EN)The invention relates to an illumination system, in particular for use in microlithography, comprising - an optical element (100) with multiple primary light sources (69.1, 69.2, 69.3, 69.4, 101.1, 101.2, 101.3, 2100.1, 2100.2), wherein - said illumination system illuminates a field in a field plane (2108) having a field contour (2112), wherein the illumination system is configured such, that each primary light source illuminates an area (2106.1, 2106.2) in said field plane, wherein a size (SP(1), SP(2) ) of the area (2106.1, 2106.2)) is smaller than a size (SF) of an area encircled by said field contour (2112).
(FR)Système d'éclairage destiné en particulier é la microlithographie, comprenant: un élément optique (100) à sources lumineuses primaires multiples (69.1, 69.2, 69.3, 69.4, 101.1, 101.2, 101.3, 2100.1, 2100.2). Ledit système d'éclairage éclaire un champ dans un plan de champ (2108) présentant un contour (2112). Le système d'éclairage est ainsi conçu que chaque source lumineuse primaire éclaire une zone (2106.1, 2106.2) dans ledit plan de champ, lune taille (SP(1), SP(2) ) de la zone (2106.1, 2106.2) de la zone étant plus petite que la taille (SF) d'une zone entourée par ledit contour de champ (2112).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)