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1. (WO2008099967) FLAKE COMPOUND
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/099967    International Application No.:    PCT/JP2008/052916
Publication Date: 21.08.2008 International Filing Date: 14.02.2008
H01B 5/14 (2006.01), C01G 23/00 (2006.01), H01B 1/08 (2006.01)
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260 (JP) (For All Designated States Except US).
SADAOKA, Kazuo [JP/JP]; (JP) (For US Only).
HATTORI, Takeshi [JP/JP]; (JP) (For US Only)
Inventors: SADAOKA, Kazuo; (JP).
HATTORI, Takeshi; (JP)
Agent: NAKAYAMA, Tohru; c/o Sumitomo Chemical Intellectual Property Service, Limited 5-33, Kitahama 4-chome Chuo-ku, Osaka-shi Osaka 5418550 (JP)
Priority Data:
2007-035907 16.02.2007 JP
(JA) 薄片状化合物
Abstract: front page image
(EN)Disclosed is a flake compound which is useful for a conductive film. Specifically disclosed is a flake compound having a conductive layer composed of M and O. In this connection, M represents at least one metal element, preferably at least one transition metal element in a mixed valent state.
(FR)L'invention concerne un composé de paillette qui est utile pour un film conducteur. Est spécifiquement décrit un composé de paillette ayant une couche conductrice composée de M et de O. A cet égard, M représente au moins un élément métallique, de préférence au moins un élément de métal de transition dans un état de valence mixte.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)