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Machine translation
1. (WO2008098640) METHOD FOR PRODUCING HIGHER SILANES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/098640    International Application No.:    PCT/EP2007/064322
Publication Date: 21.08.2008 International Filing Date: 20.12.2007
IPC:
C01B 33/107 (2006.01)
Applicants: EVONIK DEGUSSA GMBH [DE/DE]; Rellinghauser Strasse 1-11, 45128 Essen (DE) (For All Designated States Except US).
LANG, Jürgen Erwin [DE/DE]; (DE) (For US Only).
RAULEDER, Hartwig [DE/DE]; (DE) (For US Only).
MÜH, Ekkehard [DE/DE]; (DE) (For US Only)
Inventors: LANG, Jürgen Erwin; (DE).
RAULEDER, Hartwig; (DE).
MÜH, Ekkehard; (DE)
Common
Representative:
EVONIK DEGUSSA GMBH; Intellectual Property Management, Patente & Marken, Bau 1042 / PB 15, 45764 Marl (DE)
Priority Data:
10 2007 007 874.0 14.02.2007 DE
Title (DE) VERFAHREN ZUR HERSTELLUNG HÖHERER SILANE
(EN) METHOD FOR PRODUCING HIGHER SILANES
(FR) PROCÉDÉ DE FABRICATION DE SILANES SUPÉRIEURS
Abstract: front page image
(DE)Die Erfindung betrifft ein Verfahren zur Herstellung von dimeren und/oder trimeren Siliciumverbindungen, insbesondere von Siliciumhalogenverbindungen. Zudem ist das erfindungsgemäße Verfahren auch zur Herstellung von entsprechenden Germaniumverbindungen geeignet. Ferner betrifft die Erfindung eine Vorrichtung zur Durchführung des Verfahrens sowie die Verwendung der hergestellten Siliciumverbindungen.
(EN)The invention relates to a method for producing dimeric and/or trimeric silicon compounds, in particular silicon halogen compounds. The claimed method is also suitable for producing corresponding germanium compounds. The invention also relates to a device for carrying out said method to the use of the produced silicon compounds.
(FR)L'invention concerne un procédé de fabrication de composés de silicium dimères et/ou trimères, notamment de composés de silicium halogènes. Le procédé selon l'invention est également adapté à la fabrication de composés de germanium correspondants. L'invention concerne également un dispositif de mise en oeuvre de ce procédé et l'utilisation des composés de silicium ainsi fabriqués.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: German (DE)
Filing Language: German (DE)