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Machine translation
1. (WO2008098189) PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/098189    International Application No.:    PCT/US2008/053458
Publication Date: 14.08.2008 International Filing Date: 08.02.2008
IPC:
G03C 1/00 (2006.01)
Applicants: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. [US/US]; 80 Circuit Drive, North Kingstown, RI 02852 (US) (For All Designated States Except US).
RUSHKIN, Il'ya [US/US]; (US) (For US Only).
DIMOV, Ognian, N. [US/US]; (US) (For US Only).
MALIK, Sanjay [US/US]; (US) (For US Only).
DE, Binod, B.; (US) (For US Only)
Inventors: RUSHKIN, Il'ya; (US).
DIMOV, Ognian, N.; (US).
MALIK, Sanjay; (US).
DE, Binod, B.; (US)
Agent: GREELEY, Paul, D.; OHLANDT, GREELEY, RUGGIERO & PERLE, LLP, One Landmark Square, 10th Floor, Stamford, CT 06901-2682 (US)
Priority Data:
60/900,314 08.02.2007 US
Title (EN) PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES
(FR) COMPOSITIONS PHOTOSENSIBLES UTILISANT DES ADDITIFS CONTENANT DE LA SILICONE
Abstract: front page image
(EN)A photosensitve composition exhibiting high resolution and enhanced, tunable O2 plasma etch resistance comprising a silicon-containing base polymer, a silicon- containing additive, a photoacid generator and solvent is provided. A method of forming a patterned resist film is also provided.
(FR)La présente invention concerne une composition photosensible présentant une résolution élevée et une résistance à la gravure au plasma O2 améliorée, pouvant être réglée, comprenant un polymère de base contenant de la silicone, un additif contenant de la silicone, un générateur photoacide et un agent solvant. La présente invention concerne également un procédé pour former un film de résistance à motifs.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)