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Machine translation
1. (WO2008097627) CLEANING CUP SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/097627    International Application No.:    PCT/US2008/001656
Publication Date: 14.08.2008 International Filing Date: 07.02.2008
IPC:
B24B 7/22 (2006.01)
Applicants: TBW INDUSTRIES, INC.; 2389 Forest Grove Road, Furlong, PA 18925 (US) (For All Designated States Except US).
BENNER, Stephen, J. [US/US]; (US) (For US Only)
Inventors: BENNER, Stephen, J.; (US)
Agent: KOBA, Wendy, W.; P.O. Box 556, Springtown, PA 18081 (US)
Priority Data:
60/899,976 07.02.2007 US
12/069,062 07.02.2008 US
Title (EN) CLEANING CUP SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION APPARATUS
(FR) SYSTÈME DE CUVE DE NETTOYAGE POUR APPAREIL DE PLANARISATION MÉCANOCHIMIQUE
Abstract: front page image
(EN)The present invention is related to an improved cleaning cup arrangement for CMP systems that efficiently and effectively removes most, if not all, of any slurry material present on the abrasive conditioning disk and conditioner head as they are resting in the cup between conditioning cycles. The cleaning cup of the present invention includes an underside water knife for directing a high velocity stream of cleaning fluid against the rotating abrasive disk (or conditioning brush, which may be used instead of a disk) surface, and at least a pair of spray stems for directing columns of cleaning fluid with sufficient cleaning force against all exposed portions of the conditioner head.
(FR)La présente invention concerne un dispositif de cuve de nettoyage amélioré pour systèmes CMP qui élimine efficacement la plus grande partie des boues, voire toutes les boues, présentes sur le disque de conditionnement abrasif et la tête de conditionnement lorsqu'ils reposent dans la cuve entre deux cycles de conditionnement. La cuve de nettoyage de la présente invention comporte un dispositif d'injection d'eau inférieur permettant de diriger un jet ultra rapide de liquide de nettoyage contre la surface du disque abrasif en rotation (ou de la brosse de conditionnement, qui peut être utilisée à la place du disque), et au moins deux buses de pulvérisation pour envoyer des colonnes de liquide de nettoyage avec une force de nettoyage suffisante contre toutes les portions exposées de la tête de conditionnement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)