WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2008097065) ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/097065    International Application No.:    PCT/KR2008/000790
Publication Date: 14.08.2008 International Filing Date: 11.02.2008
IPC:
C08F 297/00 (2006.01)
Applicants: LG CHEM, LTD. [KR/KR]; 20, Yoido-dong, Youngdungpo-gu, Seoul 150-721 (KR) (For All Designated States Except US).
LIM, Min-Young [KR/KR]; (KR) (For US Only).
KIM, Han-Soo [KR/KR]; (KR) (For US Only).
HEO, Yoon-Hee [KR/KR]; (KR) (For US Only).
YOO, Ji-Heum [KR/KR]; (KR) (For US Only).
KIM, Sung-Hyun [KR/KR]; (KR) (For US Only)
Inventors: LIM, Min-Young; (KR).
KIM, Han-Soo; (KR).
HEO, Yoon-Hee; (KR).
YOO, Ji-Heum; (KR).
KIM, Sung-Hyun; (KR)
Agent: HANYANG PATENT FIRM; 9F Keungil Tower, 677-25, Yeoksam-dong, Gangnam-gu, Seoul 135-914 (KR)
Priority Data:
10-2007-0013145 08.02.2007 KR
Title (EN) ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS
(FR) RÉSINES DÉVELOPPABLES PAR L'ALCALI, LEUR PROCÉDÉ D'OBTENTION, ET COMPOSITION PHOTOSENSIBLE INCLUANT LESDITES RÉSINES
Abstract: front page image
(EN)The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.
(FR)L'invention porte sur une nouvelle résine développable par l'alcali, sur son procédé d'obtention, sur une composition de résine photosensible incluant la résine développable par l'alcali et sur un dispositif fabriqué en utilisant la composition photosensible. Lorsqu'on utilise la résine développable par l'alcali comme composant de la composition photosensible, la photosensibilité, la facilité de développement et la proportion de film du motif restant, sont améliorés.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Korean (KO)