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1. (WO2008096752) ETCHING METHOD AND RECORDING MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/096752    International Application No.:    PCT/JP2008/051862
Publication Date: 14.08.2008 International Filing Date: 05.02.2008
IPC:
H01L 21/3065 (2006.01), H01L 21/304 (2006.01), H01L 21/768 (2006.01), H01L 23/522 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-6, Akasaka 5-chome, Minato-ku, Tokyo 1078481 (JP) (For All Designated States Except US).
NOZAWA, Toshihisa [JP/JP]; (JP) (For US Only).
MIYATANI, Kotaro [JP/JP]; (JP) (For US Only).
HORI, Toshiyasu [JP/JP]; (JP) (For US Only).
HIROSE, Shigekazu [JP/JP]; (JP) (For US Only)
Inventors: NOZAWA, Toshihisa; (JP).
MIYATANI, Kotaro; (JP).
HORI, Toshiyasu; (JP).
HIROSE, Shigekazu; (JP)
Agent: ITOH, Hidehiko; IMY INTERNATIONAL PATENT OFFICE, Oriental Sakaisuji Bldg., 21-19, Shimanouchi 1-chome, Chuo-ku, Osaka-shi, Osaka 5420082 (JP)
Priority Data:
2007-031162 09.02.2007 JP
2007-123820 08.05.2007 JP
Title (EN) ETCHING METHOD AND RECORDING MEDIUM
(FR) PROCÉDÉ DE GRAVURE ET SUPPORT D'ENREGISTREMENT
(JA) エッチング方法および記憶媒体
Abstract: front page image
(EN)Provided is an etching method wherein a fluorine-added carbon film formed on a substrate is etched by plasma. The method includes a first step of performing etching with plasma of an oxygen-containing treatment gas, and a second step of performing etching with plasma of a fluorine-containing treatment gas.
(FR)L'invention concerne un procédé de gravure dans lequel un film de carbone au fluor formé sur un substrat est gravé par plasma. Le procédé comprend une première étape de réalisation d'une gravure par plasma d'un gaz de traitement contenant de l'oxygène, et une seconde étape de réalisation d'une gravure par plasma d'un gaz de traitement contenant du fluor.
(JA) 基板上に形成されたフッ素添加カーボン膜をプラズマによりエッチングするエッチング方法は、酸素を含む処理ガスのプラズマによりエッチングを行う第1段階と、フッ素を含む処理ガスのプラズマによりエッチングを行う第2段階とを有する。  
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)