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Pub. No.:    WO/2008/094734    International Application No.:    PCT/US2008/050774
Publication Date: 07.08.2008 International Filing Date: 10.01.2008
B41M 5/40 (2006.01), B41M 5/00 (2006.01), B05D 5/04 (2006.01)
Applicants: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; 11445 Compaq Center Drive West, Houston, TX 77070 (US) (For All Designated States Except US).
COURTENAY, Silke [CA/US]; (US) (For US Only).
BURCH, Eric L. [US/US]; (US) (For US Only).
ROSSING, David P. [US/US]; (US) (For US Only).
CHEN, Tao [CN/US]; (US) (For US Only).
CHENG, Xin [CN/US]; (US) (For US Only)
Inventors: COURTENAY, Silke; (US).
BURCH, Eric L.; (US).
ROSSING, David P.; (US).
CHEN, Tao; (US).
CHENG, Xin; (US)
Agent: DANG, Thi D.; Hewlett-Packard Company, Intellectual Property Administration, P.O. Box 272400, Mail Stop 35, Fort Collins, Colorado 80527-2400 (US)
Priority Data:
11/700,613 30.01.2007 US
Abstract: front page image
(EN)An ink receiving substrate (170) includes a base substrate (172), and an ink receptive coating (174) formed on the base substrate (172). The ink receptive coating (174) includes a binder and a fumed silica and alumina dispersion, wherein the fumed silica and alumina dispersion includes between 5 and 30% alumina particles.
(FR)Un substrat de réception d'encre (170) comprend un substrat de base (172), et un couchage amoureux de l'encre (174) formé sur ce substrat de base (172). Ce revêtement amoureux de l'encre (174) comprend un liant et une dispersion d'alumine et de silice sublimée, cette dispersion d'alumine et de silice sublimée comprenant entre 5 % et 30 % de particules d'alumine.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)