WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2008094497) TERMINATION TRENCH STRUCTURE FOR MOSGATED DEVICE AND PROCESS FOR ITS MANUFACTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/094497    International Application No.:    PCT/US2008/001081
Publication Date: 07.08.2008 International Filing Date: 28.01.2008
IPC:
H01L 21/336 (2006.01)
Applicants: INTERNATIONAL RECTIFIER CORPORATION [US/US]; 233 Kansas Street, El Segundo, CA 90245 (US) (For All Designated States Except US).
MA, Ling [CN/US]; (US) (For US Only)
Inventors: MA, Ling; (US)
Agent: WEINER, Samuel, H.; 1180 Avenue of the Americas, Fl. 7, New York, NY 10036 (US)
Priority Data:
60/887,402 31.01.2007 US
12/011,290 25.01.2008 US
Title (EN) TERMINATION TRENCH STRUCTURE FOR MOSGATED DEVICE AND PROCESS FOR ITS MANUFACTURE
(FR) STRUCTURE À TRANCHÉES DE TERMINAISON POUR DISPOSITIF À GRILLE DE MOS ET SON PROCÉDÉ DE FABRICATION
Abstract: front page image
(EN)A process for fabrication of a MOSgated device that includes a plurality of spaced trenches in the termination region thereof.
(FR)La présente invention concerne un procédé de fabrication d'un dispositif à grille de MOS qui comprend une pluralité de tranchées espacées dans sa zone de terminaison.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)