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1. (WO2008093856) POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/093856    International Application No.:    PCT/JP2008/051698
Publication Date: 07.08.2008 International Filing Date: 28.01.2008
IPC:
G03F 7/004 (2006.01), G03F 7/039 (2006.01), G03F 7/20 (2006.01)
Applicants: FUJIFILM Corporation [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo, 1060031 (JP) (For All Designated States Except US).
WADA, Kenji; (For US Only)
Inventors: WADA, Kenji;
Agent: TAKAMATSU, Takeshi; Koh-Ei Patent Firm, Kawabe Bldg., 7-9, Shimbashi 3-chome, Minato-ku, Tokyo, 1050004 (JP)
Priority Data:
2007-021104 31.01.2007 JP
2007-178474 06.07.2007 JP
Title (EN) POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION
(FR) COMPOSITION DE PHOTORÉSINE POSITIVE ET PROCÉDÉ DE FORMATION DE MOTIF L'UTILISANT
Abstract: front page image
(EN)A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid.
(FR)La présente invention concerne une composition de photorésine positive qui comprend : (A) un composé pouvant générer un acide lors d'une irradiation avec des rayons actiniques ou une radiation actinique ; (B) une résine dont la solubilité dans un révélateur alcalin augmente sous l'action d'un acide ; et (C) un composé pouvant se décomposer sous l'action d'un acide pour générer un acide.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)