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Machine translation
1. (WO2008093643) PHOTOSENSITIVE ELEMENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2008/093643    International Application No.:    PCT/JP2008/051219
Publication Date: 07.08.2008 International Filing Date: 28.01.2008
IPC:
G03F 7/09 (2006.01), G03F 7/004 (2006.01), H05K 3/00 (2006.01)
Applicants: HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 1-1, Nishi-Shinjuku 2-chome, Shinjuku-ku, Tokyo 1630449 (JP) (For All Designated States Except US).
KUBOTA, Masao [JP/JP]; (JP) (For US Only).
TAKANO, Shinji [JP/JP]; (JP) (For US Only).
YAMADA, Eiichirou [JP/JP]; (JP) (For US Only)
Inventors: KUBOTA, Masao; (JP).
TAKANO, Shinji; (JP).
YAMADA, Eiichirou; (JP)
Agent: HASEGAWA, Yoshiki; SOEI PATENT AND LAW FIRM Ginza First Bldg. 10-6, Ginza 1-chome Chuo-ku, Tokyo 1040061 (JP)
Priority Data:
2007-021014 31.01.2007 JP
Title (EN) PHOTOSENSITIVE ELEMENT
(FR) ELÉMENT PHOTOSENSIBLE
(JA) 感光性エレメント
Abstract: front page image
(EN)Disclosed is a photosensitive element (1) comprising a supporting film (10) and a layer (photosensitive layer ) (20) which is formed on the supporting film (10) and composed of a photosensitive resin composition. The supporting film (10) has a haze of 0.01-2.0%, and the total number of particles and agglomerates having a diameter of 5 &mgr;m or more contained in the supporting film (10) is not more than 5 pieces/mm2. The photosensitive layer (20) contains a binder polymer (A), a photopolymerizable compound (B) having an ethylenically unsaturated bond, and a photopolymerization initiator (C), and has a thickness of 3-30 &mgr;m.
(FR)L'invention concerne un élément photosensible (1) comprenant un film de support (10) et une couche (couche photosensible) (20) qui est formée sur le film de support (10) et qui est composée d'une composition de résine photosensible. Le film de support (10) a un flou de 0,01-2,0%, et le nombre total de particules et d'agglomérats ayant un diamètre de 5 &mgr;m ou plus contenus dans le film de support (10) ne dépasse pas 5 éléments/mm². La couche photosensible (20) contient un polymère de liaison (A), un composé photopolymérisable (B) ayant une liaison à insaturation éthylénique et un initiateur de photopolymérisation (C), et a une épaisseur de 3-30 &mgr;m.
(JA) 支持フィルム10と、該支持フィルム10上に形成された感光性樹脂組成物からなる層(感光層)20とを備える感光性エレメント1であって、支持フィルム10のヘーズが0.01~2.0%であり、かつ該支持フィルム10中に含まれる直径5μm以上の粒子及び凝集物の総数が5個/mm以下であり、感光層20が、(A)バインダーポリマー、(B)エチレン性不飽和結合を有する光重合性化合物及び(C)光重合開始剤を含有し、かつ、感光層20の厚さが3~30μmである感光性エレメント1。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)