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1. WO2008068610 - PHOTOACTIVE COMPOUNDS

Publication Number WO/2008/068610
Publication Date 12.06.2008
International Application No. PCT/IB2007/003823
International Filing Date 03.12.2007
IPC
C07C 381/12 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
381Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/-C07C337/142
12Sulfonium compounds
CPC
C07C 309/65
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
309Sulfonic acids; Halides, esters, or anhydrides thereof
63Esters of sulfonic acids
64having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
65of a saturated carbon skeleton
C07C 381/00
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
381Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
C07C 381/12
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
381Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
12Sulfonium compounds
C07D 333/76
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
333Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
50condensed with carbocyclic rings or ring systems
76Dibenzothiophenes
G03F 7/0045
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0045with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
G03F 7/029
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028with photosensitivity-increasing substances, e.g. photoinitiators
029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Applicants
  • AZ ELECTRONIC MATERIALS USA CORP. [US]/[US]
Inventors
  • PADMANABAN, Munirathna
  • CHAKRAPANI, Srinivasan
  • RAHMAN, M. Dalil
Priority Data
11/566,31204.12.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PHOTOACTIVE COMPOUNDS
(FR) COMPOSÉS PHOTOACTIFS
Abstract
(EN)
The present application relates to a compound of formula Ai Xi where Ai is an organic onium cation; and Xi is an anion of the formula X-CF2CF2OCF2CF2-SO3-. The compounds are useful as photoactive materials. Ai is selected from formula (I) and Y-Ar, where Ar is selected from formula (II), naphthyl or anthryl; Y is selected from formula (III), (IV) and (V).
(FR)
La présente invention concerne des composés de formule AiXi où Ai est un cation onium organique et Xi est un anion de formule X-CF2CF2OCF2CF2-SO3-, utiles comme matériaux photoactifs.
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