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1. WO2008047217 - ANTIREFLECTIVE COATING COMPOSITIONS

Publication Number WO/2008/047217
Publication Date 24.04.2008
International Application No. PCT/IB2007/003110
International Filing Date 15.10.2007
IPC
G03F 7/09 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
CPC
G03F 7/091
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
091characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Y10S 438/952
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
438Semiconductor device manufacturing: process
942Masking
948Radiation resist
952Utilizing antireflective layer
Applicants
  • AZ ELECTRONIC MATERIAL USA CORP. [US]/[US]
Inventors
  • KIM, WooKyu
  • WU, Hengpeng
  • ABDALLAH, David, J.
  • NEISSER, Mark
  • LU, PingHung
  • ZHANG, Ruzhi
  • RAHMAN, M., Dalil
Priority Data
11/550,45918.10.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) ANTIREFLECTIVE COATING COMPOSITIONS
(FR) COMPOSITIONS DE COUCHES ANTIREFLET
Abstract
(EN)
The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
(FR)
L'invention concerne une composition de couche antireflet comprenant (i) un générateur d'acide thermique; (ii) un polymère réticulable comprenant au moins un groupe aromatique; et (iii) un agent de réticulation polymère comprenant au moins une unité de structure (6), R11 /R12 (6), où Rn à R13 est sélectionné indépendamment entre H, le groupe aromatique et alkyle (Cr C6), R14 et R15 représentent indépendamment (C1-C10) alkyle. L'invention concerne également un procédé de représentation de la composition de couche antireflet selon l'invention.
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