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1. WO2008019803 - CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL MIRROR. PROJECTION EXPOSURE APPARATUS AND METHOD

Publication Number WO/2008/019803
Publication Date 21.02.2008
International Application No. PCT/EP2007/007093
International Filing Date 10.08.2007
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70225
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70225Catadioptric systems, i.e. documents describing optical design aspect details
G03F 7/70266
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70258Projection system adjustment, alignment during assembly of projection system
70266Adaptive optics, e.g. deformable optical elements for wavefront control
G03F 7/70275
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70275Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems
Applicants
  • CARL ZEISS SMT AG [DE]/[DE] (AllExceptUS)
  • EPPLE, Alexander [DE]/[DE] (UsOnly)
Inventors
  • EPPLE, Alexander
Agents
  • PATENTANWÄLTE RUFF, WILHELM, BEIER, DAUSTER & PARTNER
Priority Data
06016914.114.08.2006EP
60/837,31714.08.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL MIRROR. PROJECTION EXPOSURE APPARATUS AND METHOD
(FR) objectif de projection catadioptrique avec miroir pupillaire, appareil et procédé d'exposition de projection
Abstract
(EN)
A catadioptric projection objective (100) for imaging a pattern from an object field (07) arranged in an object surface (05) of the projection objective (100) onto an image field (IF) arranged in an image surface (IS) of the projection objective has a first objective part (LG1) configured to image the pattern from the object surface into a first intermediate image (IMI1), and having a first pupil surface (P1), a second objective part (HG) configured to image the first intermediate image (IMI1) into a second intermediate image (IMI2), and having a second pupil surface (P2) optically conjugate to the first pupil surface (P1), and a third objective part (LG2, LG3, LG4) configured to image the second intermediate image (IMI2) into the image surface (IS), and having a third pupil surface (P3) optically conjugate to the first and second pupil surface. A pupil mirror (113) having a reflective pupil mirror surface positioned at or dose to one of the first, second and third pupil surface. A pupil mirror manipulator operatively connected to the pupil mirror (113) and configured to vary the shape of the reflective surface of the pupil mirror allows for dynamically correcting imaging aberrations originating from lens heating, compaction and other radiation induced imaging aberrations occurring during Operation of the projection objective.
(FR)
L'invention concerne un objectif de projection catadioptrique (100) permettant d'imager un motif à partir d'un champ objet (07) disposé dans une surface objet (05) de l'objectif de projection (100) sur un champ d'image (IF) disposé dans une surface d'image (IS) de l'objectif de projection. L'objectif de projection catadioptrique (100) selon l'invention possède une première pièce d'objectif (LG1) configurée pour imager le motif à partir de la surface objet dans une première image intermédiaire (IMI1) et possédant une première surface pupillaire (P1), une seconde pièce d'objectif (HG) configurée pour imager la première image intermédiaire (IMI1) dans une seconde image intermédiaire (IMI2) et possédant une seconde surface pupillaire (P2) optiquement conjuguée à la première surface pupillaire (P1), et une troisième pièce d'objectif (LG2, LG3, LG4) configurée pour imager la seconde image intermédiaire (IMI2) dans la surface d'image (IS) et possédant une troisième surface pupillaire (P3) optiquement conjuguée à la première surface pupillaire et à la seconde surface pupillaire. L'objectif de projection comprend en outre un miroir pupillaire (113) possédant une surface de miroir pupillaire réfléchissante positionnée au niveau ou près de l'une de la première, seconde et troisième surfaces pupillaires. Un manipulateur de miroir pupillaire connecté de manière opérationnelle au miroir pupillaire (113) et configuré pour modifier la forme de la surface réfléchissante du miroir pupillaire permet de corriger de façon dynamique les aberrations d'imagerie liées au chauffage des lentilles et à la compaction et autres aberrations d'imagerie induites par la radiation et apparaissant pendant le fonctionnement de l'objectif de projection.
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