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1. WO2008018705 - APPARATUS FOR DEPOSITING THIN FILMS OVER LARGE-AREA SUBSTRATES

Publication Number WO/2008/018705
Publication Date 14.02.2008
International Application No. PCT/KR2007/003647
International Filing Date 30.07.2007
IPC
C23C 14/24 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
CPC
C23C 14/12
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
C23C 14/243
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
243Crucibles for source material
Applicants
  • SOONCHUNHYANG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION [KR]/[KR] (AllExceptUS)
  • KIM, Kug Weon [KR]/[KR] (UsOnly)
  • UM, Tai Joon [KR]/[KR] (UsOnly)
  • JOO, Young Cheol [KR]/[KR] (UsOnly)
  • LEE, Sang Wook [KR]/[KR] (UsOnly)
Inventors
  • KIM, Kug Weon
  • UM, Tai Joon
  • JOO, Young Cheol
  • LEE, Sang Wook
Agents
  • CHANG, Soo Kil
Priority Data
10-2006-007454308.08.2006KR
10-2007-002292408.03.2007KR
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) APPARATUS FOR DEPOSITING THIN FILMS OVER LARGE-AREA SUBSTRATES
(FR) APPAREIL DESTINÉ À DÉPOSER DES FILMS FINS SUR DES SUBSTRATS DE GRANDE SURFACE
Abstract
(EN)
An apparatus for increasing uniformity of thin films deposited on a substrate includes multiple deposition sources to accommodate and discharge evaporation material. A member supports the deposition sources in a selected arrangement. A heater can be used to apply heat to the deposition sources. In another embodiment, the apparatus can include a container to accommodate evaporation material. The container may include aperture at or near its center. A cover caps an opening of the container and includes multiple gas outlets. The apparatus further includes a heater disposed along an inner surface of the aperture and along an outer surface of the container.
(FR)
Appareil destiné à augmenter l'uniformité de films fins déposés sur un substrat comprenant des sources multiples de dépôt pour contenir et décharger un matériau d'évaporation. Un élément permet de maintenir les sources de dépôt dans une disposition choisie. Un élément chauffant peut être employé pour appliquer de la chaleur aux sources de dépôt. Dans un autre mode de réalisation, l'appareil peut comprendre un récipient destiné à contenir le matériau d'évaporation. Le récipient peut comprendre une ouverture en son centre ou près de celui-ci. Un couvercle recouvre une ouverture du récipient et comprend de multiples orifices de sortie de gaz. L'appareil comprend en outre un élément chauffant disposé sur une surface interne de l'ouverture et sur une surface externe du récipient.
Also published as
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