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1. WO2007147803 - PHOTOPOLYMERISABLE LAYERED COMPOSITE FOR PRODUCING FLEXO PRINTING ELEMENTS

Publication Number WO/2007/147803
Publication Date 27.12.2007
International Application No. PCT/EP2007/056019
International Filing Date 18.06.2007
Chapter 2 Demand Filed 09.04.2008
IPC
G03F 7/09 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
G03F 7/095 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
095having more than one photosensitive layer
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/09
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
G03F 7/0955
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
095having more than one photosensitive layer
0955one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/18
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
18Coating curved surfaces
Applicants
  • FLINT GROUP GERMANY GMBH [DE]/[DE] (AllExceptUS)
  • BECKER, Armin [DE]/[DE] (UsOnly)
  • STEBANI, Uwe [DE]/[DE] (UsOnly)
  • SCHADEBRODT, Jens [DE]/[DE] (UsOnly)
  • KRAUSS, Uwe [DE]/[DE] (UsOnly)
Inventors
  • BECKER, Armin
  • STEBANI, Uwe
  • SCHADEBRODT, Jens
  • KRAUSS, Uwe
Agents
  • HÖRSCHLER, Wolfram , J.
  • ISENBRUCK, Günter
Priority Data
10 2006 028 640.522.06.2006DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) FOTOPOLYMERISIERBARER SCHICHTENVERBUND ZUR HERSTELLUNG VON FLEXODRUCKELEMENTEN
(EN) PHOTOPOLYMERISABLE LAYERED COMPOSITE FOR PRODUCING FLEXO PRINTING ELEMENTS
(FR) COMPOSITE MULTI-COUCHE PHOTOPOLYMÉRISABLE DESTINÉ À LA PRODUCTION D'ÉLÉMENTS D'IMPRESSION FLEXOGRAPHIQUE
Abstract
(DE)
Schichtenverbund umfassend a) eine fotopolymerisierbare reliefbildende Schicht, mindestens enthaltend ein elastomeres Bindemittel, ethylenisch ungesättigte Monomere und einen Fotoinitiator sowie gegebenenfalls weitere Additive, b) eine gegebenenfalls fotopolymerisierbare elastomere Trägerschicht, mindestens enthaltend ein elastomeres Bindemittel, gegebenenfalls ethylenisch ungesättigte Monomere und einen Fotoinitiator sowie gegebenenfalls weitere Additive, wobei jeweils im fotopolymerisierten Zustand die reliefbildende Schicht a) eine Härte von 30 bis 70° Shore A aufweist und die elastomere Trägerschicht b) eine Härte von 75° Shore A bis 70° Shore D aufweist, und wobei die Schicht b) eine um mindestens 5° Shore A größere Härte als die Schicht a) aufweist.
(EN)
The invention relates to a layered composite comprising a) a photopolymerisable relief-forming layer at least containing an elastomer binding agent, ethylenically unsaturated monomers, a photoinitiator and optionally other additives, b) an optionally photopolymerisable elastomer carrier layer at least containing an elastomer binding agent, optionally ethylenically unsatured monomers, a photoinitiator, and optionally other additives. In the photopolymerised state, the relief-forming layer a) has a hardness of between 30 and 70° Shore A, and the elastomer carrier layer b) a hardness of between 75° Shore A and 70° Shore D, layer b) having a higher hardness than layer a) by at least 5° Shore A.
(FR)
Composite multi-couche comprenant a) une couche de formation de relief photopolymérisable contenant au moins : un liant élastomère, des monomères éthyléniquement insaturés, un photo-initiateur et éventuellement d'autres additifs ainsi que b) une couche support élastomère éventuellement photopolymérisable contenant au moins : un liant élastomère, des monomères éventuellement éthyléniquement insaturés, un photo-initiateur et éventuellement d'autres additifs. Respectivement à l'état photopolymérisé, la couche de formation de relief a) possède une dureté de 30 à 70° Shore A et la couche support élastomère possède b) une dureté de 75° Shore A à 70° Shore D, la dureté de la couche b) étant supérieure à la dureté de la couche a) d'au moins 5° Shore.
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