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1. WO2007147498 - OPTICAL APPARATUS

Publication Number WO/2007/147498
Publication Date 27.12.2007
International Application No. PCT/EP2007/005144
International Filing Date 11.06.2007
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70175
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
7015Details of optical elements
70175Lamphouse reflector arrangements, i.e. collecting light from solid angle upstream of the light source
G03F 7/702
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
702Reflective illumination, i.e. reflective optical elements other than folding mirrors
G03F 7/70583
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
7055Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
70583Speckle reduction, e.g. coherence control, amplitude/wavefront splitting
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL] (AllExceptUS)
  • MICKAN, Uwe [NL]/[NL] (UsOnly)
  • VAN DIJSSELDONK, Antonius, Johannes, Josephus [NL]/[NL] (UsOnly)
Inventors
  • MICKAN, Uwe
  • VAN DIJSSELDONK, Antonius, Johannes, Josephus
Agents
  • ROBERTS, Peter, David
Priority Data
11/471,72821.06.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) OPTICAL APPARATUS
(FR) APPAREIL OPTIQUE
Abstract
(EN)
An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident upon the convex mirror before being incident upon the concave mirror, the optical apparatus arranged to form the radiation into a radiation beam, wherein the concave mirror is translatable towards and away from the convex mirror or the convex mirror is translatable towards and away from the concave mirror, to adjust divergence of the radiation beam.
(FR)
La présente invention concerne un appareil optique qui comporte un miroir convexe et un miroir concave avec une ouverture. Dans ledit appareil, lors de l'utilisation, le rayonnement en provenance d'un émetteur de rayonnement passe à travers l'ouverture et est incident sur le miroir convexe avant d'être incident sur le miroir concave, l'appareil optique étant disposé pour former le rayonnement en un faisceau de rayonnement. Dans ledit appareil, le miroir concave peut être translaté en direction et en s'éloignant du miroir convexe ou le miroir convexe peut être translaté en direction et en s'éloignant du miroir concave, afin d'ajuster la divergence du faisceau de rayonnement.
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