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1. WO2007146912 - METHOD AND APPARATUS FOR REDUCING HAZE GROWTH ON A SUBSTRATE

Publication Number WO/2007/146912
Publication Date 21.12.2007
International Application No. PCT/US2007/070955
International Filing Date 12.06.2007
IPC
B32B 15/04 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15Layered products essentially comprising metal
04comprising metal as the main or only constituent of a layer, next to another layer of a specific substance
B32B 27/36 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27Layered products essentially comprising synthetic resin
36comprising polyesters
CPC
G03F 1/66
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
66Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
G03F 1/82
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68Preparation processes not covered by groups G03F1/20 - G03F1/50
82Auxiliary processes, e.g. cleaning or inspecting
G03F 7/70741
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
70741Handling masks outside exposure position, e.g. reticle libraries
G03F 7/7075
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
7075Handling workpieces outside exposure position, e.g. SMIF box
G03F 7/70916
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Applicants
  • TOPPAN PHOTOMASKS, INC. [US]/[US] (AllExceptUS)
  • WEST, Craig, A. [US]/[US] (UsOnly)
  • FRISA, Larry, E. [US]/[US] (UsOnly)
  • HUGHES, Gregory, P. [US]/[US] (UsOnly)
  • CHAN, Yau-wai, David [US]/[US] (UsOnly)
Inventors
  • WEST, Craig, A.
  • FRISA, Larry, E.
  • HUGHES, Gregory, P.
  • CHAN, Yau-wai, David
Agents
  • HEYMAN, Paula, D.
Priority Data
60/804,50912.06.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD AND APPARATUS FOR REDUCING HAZE GROWTH ON A SUBSTRATE
(FR) Méthode et appareillage pour réduire le dépôt d'un voile sur un substrat
Abstract
(EN)
An method and apparatus for reducing haze growth on a substrate are disclosed. The apparatus may include a container operable to store the substrate. A vapor barrier may be formed on the inside surface of the container such that the vapor barrier substantially encloses the substrate. The vapor barrier may be operable to prevent haze from growing on a surface of a substrate. In the same or alternative embodiments, the vapor barrier operable to prevent chemicals outgasing from the container from reacting with the substrate.
(FR)
L'invention concerne une méthode et un appareillage pour réduire le dépôt d'un voile sur un substrat. L'appareillage peut comprendre une enceinte servant à stocker le substrat. On peut créer une barrière de vapeur sur la surface intérieure de l'enceinte de telle sorte que la barrière de vapeur enveloppe essentiellement le substrat. La barrière de vapeur peut être utilisée pour empêcher le développement d'un voile à la surface d'un substrat. Dans la même réalisation ou dans d'autres réalisations, la barrière de vapeur sert à empêcher des émanations gazeuses provenant du dégazage de l'enceinte de réagir avec le substrat.
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