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1. WO2007146643 - MULTI-LEVEL LOAD LOCK CHAMBER, TRANSFER CHAMBER, AND ROBOT SUITABLE FOR INTERFACING WITH SAME

Publication Number WO/2007/146643
Publication Date 21.12.2007
International Application No. PCT/US2007/070328
International Filing Date 04.06.2007
IPC
H01L 21/311 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
3105After-treatment
311Etching the insulating layers
CPC
H01L 21/67201
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67155Apparatus for manufacturing or treating in a plurality of work-stations
67201characterized by the construction of the load-lock chamber
H01L 21/67742
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67739into and out of processing chamber
67742Mechanical parts of transfer devices
Y10S 414/135
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
414Material or article handling
135Associated with semiconductor wafer handling
Y10T 29/49826
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
29Metal working
49Method of mechanical manufacture
49826Assembling or joining
Applicants
  • APPLIED MATERIALS, INC. [US]/[US] (AllExceptUS)
  • MOORE, Robert B. [US]/[US] (UsOnly)
  • RUHLAND, Eric [US]/[US] (UsOnly)
  • SUNDAR, Satish [IN]/[US] (UsOnly)
  • SILVETTI, Mario David [US]/[US] (UsOnly)
Inventors
  • MOORE, Robert B.
  • RUHLAND, Eric
  • SUNDAR, Satish
  • SILVETTI, Mario David
Agents
  • PATTERSON, B. Todd
Priority Data
11/424,46115.06.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MULTI-LEVEL LOAD LOCK CHAMBER, TRANSFER CHAMBER, AND ROBOT SUITABLE FOR INTERFACING WITH SAME
(FR) CHAMBRE DE VERROUILLAGE DE CHARGEMENT MULTI-NIVEAU, CHAMBRE DE TRANSFERT, ET ROBOT APPROPRIÉ POUR ASSURER L'INTERFACE AVEC CELLES-CI
Abstract
(EN)
A new apparatus for processing substrates is disclosed A multi-level load lock chamber (10) having four environmentally isolated chambers interfaces with a transfer chamber (400) that has a robotic assembly (600) The robotic assembly has two arms (618) that each move horizontally as the robotic assembly rotates about its axis The arms each reach into the isolated chambers of the load lock to receive substrates from the bottom isolated chamber, transport the substrates to process chambers, and then place the substrates in the upper chambers The isolated chambers in the load lock chamber have a pivotally attached lid that may be opened to access the inside of the isolated chambers
(FR)
L'invention concerne un nouvel appareil destiné à traiter des substrats. Une chambre de verrouillage de chargement multi-niveau ayant quatre chambres isolées de l'extérieur est en interface avec une chambre de transfert qui présente un ensemble robotique. L'ensemble robotique présente deux bras, chaque bras pouvant bouger horizontalement lorsque l'ensemble robotique tourne autour de son axe. Les bras peuvent atteindre l'intérieur des chambres isolées de la chambre de verrouillage de chargement afin de recevoir les substrats par le fond des chambres isolées, transporter les substrats vers les chambres de traitement, et ensuite placer les substrats dans les chambres supérieures. Les chambres isolées dans la chambre de verrouillage de chargement peuvent présenter un couvercle rattaché de façon à pivoter. Ce couvercle pouvant être ouvert afin d'accéder à l'intérieur des chambres isolées.
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