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1. WO2007145904 - METHODS AND APPARATUS FOR SUPPORTING A SUBSTRATE IN A HORIZONTAL ORIENTATION DURING CLEANING

Publication Number WO/2007/145904
Publication Date 21.12.2007
International Application No. PCT/US2007/013170
International Filing Date 04.06.2007
IPC
A46B 13/00 2006.01
AHUMAN NECESSITIES
46BRUSHWARE
BBRUSHES
13Brushes with driven brush bodies
B08B 3/10 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3Cleaning by methods involving the use or presence of liquid or steam
04Cleaning involving contact with liquid
10with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity, by vibration
B08B 7/04 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
04by a combination of operations
B24B 51/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
24GRINDING; POLISHING
BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
51Arrangements for automatic control of a series of individual steps in grinding a workpiece
CPC
B08B 1/04
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
1Cleaning by methods involving the use of tools, brushes, or analogous members
04using rotary operative members
B08B 11/02
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
11Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
02Devices for holding articles during cleaning
H01L 21/67046
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67028for cleaning followed by drying, rinsing, stripping, blasting or the like
6704for wet cleaning or washing
67046using mainly scrubbing means, e.g. brushes
Applicants
  • APPLIED MATERIALS, INC. [US]/[US]
Inventors
  • OLGADO, Donald, J., K.
  • NANGOY, Roy, C.
  • TULSHIBAGWALE, Sheshraj, L.
  • CHEN, Hui
  • SHIN, Ho, Seon
Agents
  • DUGAN, Brian, M.
Priority Data
60/811,16105.06.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHODS AND APPARATUS FOR SUPPORTING A SUBSTRATE IN A HORIZONTAL ORIENTATION DURING CLEANING
(FR) PROCÉDÉS ET APPAREIL POUR SUPPORTER UN SUBSTRAT DANS UNE ORIENTATION HORIZONTALE PENDANT LE NETTOYAGE DE CELUI-CI
Abstract
(EN)
In one or more aspects, an apparatus (100) for cleaning a substrate includes (i) a plurality of rollers (102a-d) adapted to contact and support the substrate (S) in a horizontal orientation, and (2) at least one brush ( 106) adapted to contact a major surface of the substrate (S) while the substrate (S) is supported by the plurality of rollers (102a-d) to clean the major surface of the substrate (S) At least one of the plurality of rollers (l02a-d) is adapted to move between an opened position allowing the substrate (S) to be loaded onto or unloaded from the plurality of rollers (l O2a-d) and a closed position in which the substrate (S) is supported by the plurality of rollers (102a-d) Numerous other aspects are provided
(FR)
Dans un ou plusieurs aspects, l'invention concerne un appareil pour nettoyer un substrat, comprenant (1) une pluralité de rouleaux adaptés pour entrer en contact avec et supporter le substrat dans une orientation horizontale, et (2) au moins une brosse adaptée pour entrer en contact avec une surface principale du substrat pendant que le substrat est supporté par la pluralité de rouleaux pour nettoyer la surface principale du substrat. Au moins un des rouleaux de la pluralité de rouleaux est adapté pour se déplacer entre une position ouverte qui permet au substrat d'être chargé sur ou déchargé de la pluralité de rouleaux et une position fermée dans laquelle le substrat est supporté par la pluralité de rouleaux. De nombreux autres aspects sont prévus.
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