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1. WO2007145255 - LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE

Publication Number WO/2007/145255
Publication Date 21.12.2007
International Application No. PCT/JP2007/061924
International Filing Date 13.06.2007
IPC
H05B 33/10 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33Electroluminescent light sources
10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H01L 51/50 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
CPC
C23C 14/12
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
C23C 14/28
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
28by wave energy or particle radiation
H01L 51/001
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
0001Processes specially adapted for the manufacture or treatment of devices or of parts thereof
0002Deposition of organic semiconductor materials on a substrate
0008using physical deposition, e.g. sublimation, sputtering
001Vacuum deposition
H01L 51/56
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes [OLED] or polymer light emitting devices [PLED]
56Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants
  • 東京エレクトロン株式会社 TOKYO ELECTRON LIMITED [JP]/[JP] (AllExceptUS)
  • 国立大学法人東北大学 National University Corporation Tohoku University [JP]/[JP] (AllExceptUS)
  • 八木 靖司 YAGI, Yasushi [JP]/[JP] (UsOnly)
  • 渡辺 伸吾 WATANABE, Shingo [JP]/[JP] (UsOnly)
  • 野沢 俊久 NOZAWA, Toshihisa [JP]/[JP] (UsOnly)
  • 河村 忠一 KAWAMURA, Chuichi [JP]/[JP] (UsOnly)
  • 吉野 公彦 YOSHINO, Kimihiko [JP]/[JP] (UsOnly)
  • 大見 忠弘 OHMI, Tadahiro [JP]/[JP] (UsOnly)
Inventors
  • 八木 靖司 YAGI, Yasushi
  • 渡辺 伸吾 WATANABE, Shingo
  • 野沢 俊久 NOZAWA, Toshihisa
  • 河村 忠一 KAWAMURA, Chuichi
  • 吉野 公彦 YOSHINO, Kimihiko
  • 大見 忠弘 OHMI, Tadahiro
Agents
  • 伊東 忠彦 ITOH, Tadahiko
Priority Data
2006-16496514.06.2006JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING LIGHT-EMITTING DEVICE
(FR) DISPOSITIF ÉLECTROLUMINESCENT ET SON PROCÉDÉ DE FABRICATION
(JA) 発光素子および発光素子の製造方法
Abstract
(EN)
Disclosed is an apparatus for manufacturing a light-emitting device which is characterized by comprising a plurality of processing chambers for performing a substrate processing for forming a light-emitting device having a plurality of layers including an organic layer on a subject to be processed. The apparatus is also characterized in that each processing chamber is structured so that the processing of the substrate is performed while having a device mounting surface of the substrate, on which a light-emitting device is formed, face a direction opposite to the gravity direction.
(FR)
La présente invention concerne un appareil pour fabriquer un dispositif électroluminescent, caractérisé en ce qu'il comprend une pluralité de chambres de traitement pour réaliser un traitement de substrat afin de former un dispositif électroluminescent ayant une pluralité de couches comprenant une couche organique sur un sujet à traiter. L'appareil est également caractérisé en ce que chaque chambre de traitement est structurée de sorte que le traitement du substrat soit réalisé, tout en ayant une surface de montage de dispositif du substrat, sur laquelle est formé le dispositif électroluminescent, il fait face à une direction opposée à la direction de la gravité.
(JA)
 被処理基板上に有機層を含む複数の層を有する発光素子を形成するための基板処理が行われる、複数の処理室を有し、複数の処理室は、それぞれ、被処理基板の発光素子が形成される素子形成面が、重力方向と反対の方向を向くようにして被処理基板の基板処理が行われるように構成されていることを特徴とする発光素子の製造装置が開示される。
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