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1. WO2007141235 - APPARATUS AND METHOD FOR VAPOUR DEPOSITING A POWDERED ORGANIC STARTING MATERIAL

Publication Number WO/2007/141235
Publication Date 13.12.2007
International Application No. PCT/EP2007/055461
International Filing Date 04.06.2007
IPC
C23C 14/12 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
C23C 14/24 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
CPC
C23C 14/12
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
12Organic material
C23C 14/228
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
228Gas flow assisted PVD deposition
C23C 14/24
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
C23C 14/246
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
24Vacuum evaporation
246Replenishment of source material
Applicants
  • AIXTRON AG [DE]/[DE] (AllExceptUS)
  • STRAUCH, Gerhard Karl [DE]/[DE] (UsOnly)
Inventors
  • STRAUCH, Gerhard Karl
Agents
  • GRUNDMANN, Dirk
Priority Data
10 2006 026 576.906.06.2006DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) VORRICHTUNG UND VERFAHREN ZUM AUFDAMPFEN EINES PULVERFÖRMIGEN ORGANISCHEN AUSGANGSSTOFFS
(EN) APPARATUS AND METHOD FOR VAPOUR DEPOSITING A POWDERED ORGANIC STARTING MATERIAL
(FR) PROCÉDÉ ET DISPOSITIF POUR LA VAPORISATION D'UN MATÉRIAU DE DÉPART ORGANIQUE SOUS FORME DE POUDRE
Abstract
(DE)
Die Erfindung betrifft ein Verfahren zum Beschichten einer Oberfläche eines Substrates (17) mit einem organischen Material, wobei das organische Material als pulverförmiger Ausgangsstoff (10) vorliegt, der bei einer Temperatur, die unterhalb der Zerlegungstemperatur der das organische Material bildenden Moleküle liegt, in einem Vorratsbehälter (1) bevorratet wird, von wo aus er dosiert in eine Verdampfungseinrichtung (2) gebracht wird, wo er zufolge Wärmezufuhr verdampft. Um das eingangs genannte Verfahren bzw. die eingangs genannte Vorrichtung zum Aufdampfen eines pulverförmigen Materials zu verbessern. Insbesondere die Dampferzeugungsrate zu erhöhen, wird vorgeschlagen, dass der pulverförmige Ausgangsstoff (10) von einem Trägergas in die Verdampfungseinrichtung (2) gebracht wird und die Wärmezufuhr durch Aufheizen des Trägergases erfolgt.
(EN)
The invention relates to a method for coating a surface of a substrate (17) with an organic material, wherein the organic material is in the form of a powdered starting material (10), which is kept in a storage container (1) at a temperature that lies below the decomposing temperature of the molecules forming the organic material, from where it is metered into an evaporating device (2), where it evaporates as a result of heat being supplied. In order to improve the method mentioned at the beginning or the apparatus mentioned at the beginning for vapour depositing a powdered material, in particular to increase the vapour generating rate, it is proposed that the powdered starting material (10) is brought into the evaporating device (2) by a carrier gas and the heat is supplied by heating up the carrier gas.
(FR)
L'invention concerne un procédé de revêtement d'une surface d'un substrat (17) avec un matériau organique, le matériau organique se présentant sous forme d'un matériau de départ (10) poudreux et étant stocké dans un réservoir de stockage (1) à une température inférieure à la température de décomposition des molécules formant le matériau organique, le matériau étant extrait de ce réservoir pour être introduit de manière dosée dans un dispositif de vaporisation (2), dans lequel il s'évapore selon l'alimentation en chaleur. L'objectif est d'améliorer le procédé et le dispositif décrits précédemment pour la vaporisation d'un matériau poudreux. Afin notamment d'accroître la vitesse de génération de vapeur, le matériau poudreux de départ (10) est introduit par un gaz porteur dans le dispositif de vaporisation (2) et l'alimentation en chaleur a lieu par chauffage du gaz porteur.
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