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1. WO2007141003 - SPUTTER TARGET WITH SPUTTER MATERIAL BASED ON TIO2, AND A PRODUCTION METHOD

Publication Number WO/2007/141003
Publication Date 13.12.2007
International Application No. PCT/EP2007/005010
International Filing Date 06.06.2007
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
CPC
C04B 2235/3232
CCHEMISTRY; METALLURGY
04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE
2235Aspects relating to ceramic starting mixtures or sintered ceramic products
02Composition of constituents of the starting material or of secondary phases of the final product
30Constituents and secondary phases not being of a fibrous nature
32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
3232Titanium oxides or titanates, e.g. rutile or anatase
C04B 2235/3251
CCHEMISTRY; METALLURGY
04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE
2235Aspects relating to ceramic starting mixtures or sintered ceramic products
02Composition of constituents of the starting material or of secondary phases of the final product
30Constituents and secondary phases not being of a fibrous nature
32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
3251Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
C04B 2235/3286
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04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE
2235Aspects relating to ceramic starting mixtures or sintered ceramic products
02Composition of constituents of the starting material or of secondary phases of the final product
30Constituents and secondary phases not being of a fibrous nature
32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
3286Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
C04B 2235/786
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2235Aspects relating to ceramic starting mixtures or sintered ceramic products
70Aspects relating to sintered or melt-casted ceramic products
74Physical characteristics
78Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
786Micrometer sized grains, i.e. from 1 to 100 micron
C04B 35/46
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35Shaped ceramic products characterised by their composition
01based on oxide ceramics
46based on titanium oxides or titanates
C04B 35/462
CCHEMISTRY; METALLURGY
04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE
35Shaped ceramic products characterised by their composition
01based on oxide ceramics
46based on titanium oxides or titanates
462based on titanates
Applicants
  • W.C. HERAEUS GMBH [DE]/[DE] (AllExceptUS)
  • WEIGERT, Martin [DE]/[DE] (UsOnly)
  • SIMONS, Christoph [DE]/[DE] (UsOnly)
  • MÄNNLE, Eckehard [DE]/[DE] (UsOnly)
Inventors
  • WEIGERT, Martin
  • SIMONS, Christoph
  • MÄNNLE, Eckehard
Agents
  • KÜHN, Hans-Christian
Priority Data
10 2006 027 029.009.06.2006DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) SPUTTERTARGET MIT EINEM SPUTTERMATERIAL AUF BASIS TIO2 SOWIE HERSTELLVERFAHREN
(EN) SPUTTER TARGET WITH SPUTTER MATERIAL BASED ON TIO2, AND A PRODUCTION METHOD
(FR) CIBLE DE PULVÉRISATION AVEC UN MATÉRIAU DE PULVÉRISATION À BASE DE TIO2 AINSI QUE PROCÉDÉ DE FABRICATION
Abstract
(DE)
Die Erfindung betrifft ein Sputtertarget mit einem Sputtermaterial auf Basis TiO2 und besteht darin, dass das Sputtermaterial 15-60Mol-% Nb20s aufweist. Es betrifft ferner ein Verfahren zur Herstellung eines Sputtertargets mit folgenden Schritten: - Mischen von TiO2- und Nb2O5-Pulver in einem flüssigen Schlicker - Sprühgranulation dieses Schlickers zu TiO2:Nb2O5-Mischoxidgranulat - Plasmaspritzen dieses Granulates auf einen Sputtertargetgrundkörper.
(EN)
The invention relates to a sputter target, with sputter material based on TiO2 which has 15-60 mol % of Nb20s. The invention further relates to a method for the production of a sputter target consisting of the following steps: - mixture of TiO2 and Nb2O5 powder in liquid slurry – spraying of this slurry to cause the TiO2-Nb2O5 mixed oxide mixture to granulate – plasma spraying of this granulated mixture onto the base body of a sputter target.
(FR)
L'invention concerne une cible de pulvérisation avec un matériau de pulvérisation à base de TiO2 et consiste en ce que, le matériau de pulvérisation présente 15 à 60 % en mol de Nb2O5. Elle concerne en outre un procédé de fabrication d'une cible de pulvérisation avec les étapes suivantes : - mélange de poudres de TiO2 et de Nb2O5 dans une suspension liquide - granulation par pulvérisation de cette suspension formant un granulat du mélange d'oxydes TiO2:Nb2O5 - application de ce granulat par jaillissement de plasma sur une base solide de cible de pulvérisation.
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