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1. WO2007139896 - SUBSTRATE PROCESSING APPARATUS

Publication Number WO/2007/139896
Publication Date 06.12.2007
International Application No. PCT/US2007/012407
International Filing Date 24.05.2007
Chapter 2 Demand Filed 20.11.2007
IPC
H01L 21/677 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677for conveying, e.g. between different work stations
CPC
H01L 21/67161
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67155Apparatus for manufacturing or treating in a plurality of work-stations
67161characterized by the layout of the process chambers
H01L 21/67173
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67155Apparatus for manufacturing or treating in a plurality of work-stations
67161characterized by the layout of the process chambers
67173in-line arrangement
H01L 21/67709
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67709using magnetic elements
H01L 21/67715
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67715Changing the direction of the conveying path
H01L 21/67724
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67724by means of a cart or a vehicule
H01L 21/67727
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67727using a general scheme of a conveying path within a factory
Applicants
  • BROOKS AUTOMATION, INC. [US]/[US] (AllExceptUS)
  • HOFFMEISTER, Christopher [US]/[US] (UsOnly)
  • CAVENEY, Robert, T. [US]/[US] (UsOnly)
Inventors
  • HOFFMEISTER, Christopher
  • CAVENEY, Robert, T.
Agents
  • GREEN, Clarence, A.
Priority Data
11/442,50926.05.2006US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SUBSTRATE PROCESSING APPARATUS
(FR) APPAREIL DE TRAITEMENT DE SUBSTRATS
Abstract
(EN)
Substrate processing apparatus (4010) having a transport chamber (4602), a linear array of substrate holding modules (4300) alongside the transport chamber, and a substrate transport (4571) located in the chamber. The chamber can hold an isolated atmosphere, and defines more than one substantially linear transport paths extending longitudinally along the transport chamber. The transport in the chamber is capable of transporting the substrate along the linear transport paths. The transport has a transporter capable of holding and moving the substrate. The transporter interfaces a wall of the transport chamber for moving along at least one of linear paths. The transport chamber has interfaces for mating with other substrate holding modules at opposite ends of the transport chamber. Each interface has an opening through which at least one of the more than one linear transport paths extends, and the transport chamber has a selectably variable longitudinal length between the interfaces.
(FR)
Appareil de traitement de substrats avec chambre de transport, rangée linéaire de porte-substrats sur la longueur de la chambre de transport, et transporteur de substrat dans la chambre. La chambre, capable de confinement d'atmosphère, définit dans sa longueur plusieurs chemins de transport sensiblement linéaires. Dans la chambre, le transporteur est capable de transporter le substrat le long des chemins de transport linéaires. Le transporteur comporte un module de transport capable de porter et déplacer le substrat. Le module de transport vient en interface avec une paroi de la chambre de transport de façon à parcourir l'un au moins des chemins linéaires. La chambre de transport comporte des interfaces venant s'adapter sur d'autres porte-substrats aux extrémités opposées de la chambre de transport. Chaque interface comporte une ouverture à travers laquelle se prolonge l'un au moins des chemins de transport linéaires. En outre, entre les interfaces, la longueur de la chambre de transport est sélectivement variable selon l'axe de la longueur.
Latest bibliographic data on file with the International Bureau