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1. WO2007138683 - PROTECTIVE FILM

Publication Number WO/2007/138683
Publication Date 06.12.2007
International Application No. PCT/JP2006/310804
International Filing Date 30.05.2006
IPC
G03F 1/48 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
48Protective coatings
CPC
G03F 1/48
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
48Protective coatings
G03F 7/2014
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2002with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
Applicants
  • ソマール株式会社 SOMAR CORPORATION [JP]/[JP] (AllExceptUS)
  • 林 虎雄 HAYASHI, Torao [JP]/[JP] (UsOnly)
  • 中谷 陽子 NAKAYA, Yoko [JP]/[JP] (UsOnly)
  • 門脇 昭典 KADOWAKI, Akinori [JP]/[JP] (UsOnly)
Inventors
  • 林 虎雄 HAYASHI, Torao
  • 中谷 陽子 NAKAYA, Yoko
  • 門脇 昭典 KADOWAKI, Akinori
Agents
  • 渡邉 一平 WATANABE, Kazuhira
Priority Data
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PROTECTIVE FILM
(FR) FILM PROTECTEUR
(JA) 保護フィルム
Abstract
(EN)
A protective film (1) for photomasks which comprises a base film (2) having light-transmitting properties, a release layer (3) disposed on one side of the base film (2), and a pressure-sensitive adhesive layer (4) disposed on the other side of the base film (2), wherein the pressure-sensitive adhesive layer (4) is made of a pressure-sensitive adhesive composition comprising as essential ingredients an amidated acrylic resin (A), an aliphatic isocyanate (B), and an antioxidant (C). The protective film (1) is suitable for use in exposing a tacky photoresist to light. Even when exposure to ultraviolet is repeatedly conducted, the pressure-sensitive adhesive layer is inhibited from yellowing and is effectively prevented from decreasing in peel strength.
(FR)
L'invention concerne un film protecteur (1) pour masque photographique, comprenant un film de base (2) ayant des propriétés de transmission de la lumière, une couche de décollage (3) disposée sur un côté du film de base (2) et une couche d'adhésif sensible à la pression (4) disposée sur l'autre côté du film de base (2), la couche d'adhésif sensible à la pression (4) étant constituée d'une composition d'adhésif sensible à la pression comprenant en tant qu'ingrédients essentiels une résine acrylique amidée (A), un isocyanate aliphatique (B) et un antioxydant (C). Le film protecteur (1) convient à une utilisation pour exposer un photorésist collant à la lumière. Même lorsqu'une exposition aux ultraviolets est réalisée de manière répétée, la couche d'adhésif sensible à la pression ne jaunit pas et ne perd pas sa résistance au pelage.
(JA)
 光透過性を有する基材フィルム2と、基材フィルム2の一方の面に配設された離型層3と、基材フィルム2の他方の面に配設された粘着層4とを備えたフォトマスク用の保護フィルム1であって、粘着層4が、(A)アミド基を含有するアクリル樹脂、(B)脂肪族系イソシアネート、及び(C)酸化防止剤、を必須成分とする粘着剤組成物からなる保護フィルム1。粘着性を有するフォトレジストを露光する際に好適に用いることができ、繰り返し紫外線を照射して露光を行った場合でも、粘着層の黄変が抑制されるとともに、剥離力の低下が有効に防止されている。
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