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1. WO2007097350 - POSITION MEASURING DEVICE AND POSITION MEASURING METHOD, MOBILE BODY DRIVING SYSTEM AND MOBILE BODY DRIVING METHOD, PATTERN FORMING DEVICE AND PATTERN FORMING METHOD, EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

Publication Number WO/2007/097350
Publication Date 30.08.2007
International Application No. PCT/JP2007/053140
International Filing Date 21.02.2007
IPC
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G01B 11/00 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70775
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70775Position control
Applicants
  • 株式会社ニコン NIKON CORPORATION [JP]/[JP] (AllExceptUS)
  • 株式会社仙台ニコン SENDAI NIKON CORPORATION [JP]/[JP] (AllExceptUS)
  • 牧野内 進 MAKINOUCHI, Susumu [JP]/[JP] (UsOnly)
  • 今井 亨 IMAI, Toru [JP]/[JP] (UsOnly)
  • 渡邉 昭宏 WATANABE, Akihiro [JP]/[JP] (UsOnly)
Inventors
  • 牧野内 進 MAKINOUCHI, Susumu
  • 今井 亨 IMAI, Toru
  • 渡邉 昭宏 WATANABE, Akihiro
Agents
  • 立石 篤司 TATEISHI, Atsuji
Priority Data
2006-04459721.02.2006JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) POSITION MEASURING DEVICE AND POSITION MEASURING METHOD, MOBILE BODY DRIVING SYSTEM AND MOBILE BODY DRIVING METHOD, PATTERN FORMING DEVICE AND PATTERN FORMING METHOD, EXPOSURE DEVICE AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
(FR) DISPOSITIF ET PROCEDE DESTINES A LA MESURE D'UNE POSITION, SYSTEME ET PROCEDE DESTINES A L'ENTRAINEMENT D'UN CORPS MOBILE, DISPOSITIF ET PROCEDE DESTINES A LA FORMATON D'UN MOTIF, DISPOSITIF ET PROCEDE DESTINES A L'EXPOSITION, ET PROCEDE DE FABRICATION D'UN DISPOSITIF
(JA) 位置計測装置及び位置計測方法、移動体駆動システム及び移動体駆動方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
Abstract
(EN)
A position measuring device includes linear encoders (50A to 50D) having four movable scales (44A to 44D) which are secured to a wafer stage (WST) and surround a wafer (W); and head units (46A to 46D) which are corresponding to the movable scales and emit a light having a wavelength in the longitudinal direction substantially longer than that in the direction perpendicular to the longitudinal direction. The information on the position of the wafer stage (WST) in an XY plane is calculated on the basis of the results of measured by the encoders. Thereby, the position of a mobile body can be accurately measured without increasing the size.
(FR)
La présente invention concerne un dispositif de mesure de position qui comprend : des codeurs linéaires (50A à 50D) présentant quatre échelles amovibles (44A à 44D) qui sont fixées à l'étage de la tranche (WST) et entourent celle-ci (W); et des unités têtes (46A à 46D) qui correspondent aux échelles amovibles et émettent une lumière dont la longueur d'onde dans la direction longitudinale est sensiblement plus longue que celle dans la direction perpendiculaire à la direction longitudinale. Les informations relatives à la position de l'étage de la tranche (WST) dans un plan XY sont calculées sur la base de résultats mesurés par les codeurs. On mesure ainsi avec précision la position d'un corps mobile sans augmenter la taille.
(JA)
 ウエハ(W)を取り囲んでウエハステージ(WST)に固定されている4つの移動スケール(44A~44D)と、各移動スケールに対応し、その長手方向の長さのほうが、それに直交する方向の長さよりも実質的に長い光をそれぞれ射出するヘッドユニット(46A~46D)とを有するリニアエンコーダ(50A~50D)を備える。そして、各エンコーダの計測結果に基づいて、ウエハステージ(WST)のXY面内の位置情報を算出する。これにより、大型化を招くことなく、移動体の位置を精度良く計測することができる。
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