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Pub. No.:    WO/2007/095361    International Application No.:    PCT/US2007/004128
Publication Date: 23.08.2007 International Filing Date: 13.02.2007
C07C 43/115 (2006.01), C08G 61/12 (2006.01)
Applicants: E. I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street, Wilmington, Delaware 19898 (US) (For All Designated States Except US).
KIPP, Brian, Edward [US/US]; (US) (For US Only).
SPRAGUE, Lee, G. [US/US]; (US) (For US Only)
Inventors: KIPP, Brian, Edward; (US).
SPRAGUE, Lee, G.; (US)
Agent: HENDRICKSON, John, S.; E. I. du Pont de Nemours and Company, Legal Patent Records Center, 4417 Lancaster Pike, Wilmington, Delaware 19805 (US)
Priority Data:
60/772,622 13.02.2006 US
Abstract: front page image
(EN)New monomers, norbornenylmethyl fluoroalkyl ethers, made by reaction of bicyclo(2,2,1)hept-5-ene-2-methanol with fluoro(alkyl vinyl ethers), are described. These monomers are useful in making polymers such as hydrophobic, hydrolytically-resistant polymers for photoresists, particularly for use in photoimaging by immersion lithography with 193 nm light.
(FR)L'invention concerne de nouveaux monomères, les éthers de norbornenylméthyl fluoroalkyle, obtenus par réaction de bicyclo(2,2,1)hept-5-ène-2-méthanol avec des éthers de fluoroalkylvinyle. Ces monomères sont utiles pour la fabrication de polymères tels des polymères hydrophobes résistants à l'électrolyse pour photorésines, en particulier pour une utilisation en photoimagerie par lithographie en immersion avec une lumière de 193 nm.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)