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Machine translation
1. (WO2007094957) INFINITELY SELECTIVE PHOTORESIST MASK ETCH
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/094957    International Application No.:    PCT/US2007/002511
Publication Date: 23.08.2007 International Filing Date: 30.01.2007
IPC:
H01L 21/311 (2006.01)
Applicants: LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway, Fremont, CA 94538 (US) (For All Designated States Except US).
KIM, Ji Soo [KR/US]; (US) (For US Only).
CIRIGLIANO, Peter [US/US]; (US) (For US Only).
LEE, Sangheon [KR/US]; (US) (For US Only).
HEO, Dongho [KR/US]; (US) (For US Only).
CHOI, Daehan [KR/US]; (US) (For US Only).
SADJADI, S.M. Reza [US/US]; (US) (For US Only)
Inventors: KIM, Ji Soo; (US).
CIRIGLIANO, Peter; (US).
LEE, Sangheon; (US).
HEO, Dongho; (US).
CHOI, Daehan; (US).
SADJADI, S.M. Reza; (US)
Agent: LEE, Michael B.K.; Beyer Law Group LLP, P.O. Box 1687, Cupertino, CA 95015-1687 (US)
Priority Data:
11/357,548 17.02.2006 US
Title (EN) INFINITELY SELECTIVE PHOTORESIST MASK ETCH
(FR) GRAVURE DE MASQUE PHOTORÉSISTANT INFINIMENT SÉLECTIVE
Abstract: front page image
(EN)A method for etching features into an etch layer disposed below a photoresist mask without an intermediate hardmask is provided. A plurality of etch cycles are provided. Each etch cycle comprises providing a deposition etch phase that etches features into the etch layer and deposits polymer on sidewalls of the features and over the photoresist and providing a cleaning phase that removes polymer deposited on the sidewalls.
(FR)La présente invention concerne un procédé permettant de graver des éléments dans une couche de gravure disposée en dessous d'un masque photorésistant sans masque dur intermédiaire. Le procédé est constitué d'une pluralité de cycles de gravure. Chaque cycle de gravure consiste à réaliser une phase de gravure par dépôt qui grave les éléments de gravure dans la couche de gravure et dépose un polymère sur les parois latérales des éléments et sur le masque photorésistant et à réaliser une phase de nettoyage qui retire le polymère déposé sur les parois latérales.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)