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1. (WO2007094605) TOPICAL PREPARATION COMPOSITION CONTAINING A THIOUREA DERIVATIVE FOR PREVENTING OR TREATING PRURITIC OR IRRITANT SKIN DISEASES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2007/094605    International Application No.:    PCT/KR2007/000778
Publication Date: 23.08.2007 International Filing Date: 14.02.2007
IPC:
A61K 31/17 (2006.01), A61K 9/10 (2006.01), A61K 9/107 (2006.01), A61P 17/10 (2006.01), A61P 17/04 (2006.01)
Applicants: AMOREPACIFIC CORPORATION [KR/KR]; 181, 2-ga, Hangang-ro, Yongsan-gu, Seoul 140-777 (KR) (For All Designated States Except US).
KIM, Dae Kwon [KR/KR]; (KR) (For US Only).
KIM, Kwang Mi [KR/KR]; (KR) (For US Only).
SUNG, Dae-Seok [KR/KR]; (KR) (For US Only).
PARK, Jong Hee [KR/KR]; (KR) (For US Only).
KIM, Hyoung June [KR/KR]; (KR) (For US Only).
YUN, Jun Won [KR/KR]; (KR) (For US Only).
PARK, Young-Ho [KR/KR]; (KR) (For US Only).
LIM, Kyung Min [KR/KR]; (KR) (For US Only).
CHOI, Jin Kyu [KR/KR]; (KR) (For US Only).
KOH, Hyun Ju [KR/KR]; (KR) (For US Only).
JEONG, Yeon Su [KR/KR]; (KR) (For US Only).
LEE, Chang Hoon [KR/KR]; (KR) (For US Only).
KIM, Jung Ju [KR/KR]; (KR) (For US Only)
Inventors: KIM, Dae Kwon; (KR).
KIM, Kwang Mi; (KR).
SUNG, Dae-Seok; (KR).
PARK, Jong Hee; (KR).
KIM, Hyoung June; (KR).
YUN, Jun Won; (KR).
PARK, Young-Ho; (KR).
LIM, Kyung Min; (KR).
CHOI, Jin Kyu; (KR).
KOH, Hyun Ju; (KR).
JEONG, Yeon Su; (KR).
LEE, Chang Hoon; (KR).
KIM, Jung Ju; (KR)
Agent: JANG, Seongku; 19th Fl., Trust Tower, #275-7, Yangjae-dong, Seocho-ku, Seoul 137-130 (KR)
Priority Data:
10-2006-0014056 14.02.2006 KR
Title (EN) TOPICAL PREPARATION COMPOSITION CONTAINING A THIOUREA DERIVATIVE FOR PREVENTING OR TREATING PRURITIC OR IRRITANT SKIN DISEASES
(FR) COMPOSITION DE PRÉPARATION TOPIQUE CONTENANT UN DÉRIVÉ THIOURÉE SERVANT À PRÉVENIR OU À TRAITER DES DERMATOSES PRURIGINEUSES OU IRRITANTES
Abstract: front page image
(EN)The present invention relates to a topical composition comprising a thiourea derivative, which is a vanilloid receptor antagonist, and a pharmaceutically acceptable carrier and a pharmaceutical use of the same. The topical composition according to the present invention is excellent in skin permeation and stability and effective in treatment of pruritic or irritant skin diseases.
(FR)La présente invention concerne d'une part une composition topique comprenant un dérivé thiourée, qui est un antagoniste des récepteurs vanilloïdes, et un excipient pharmaceutiquement acceptable et d'autre part une utilisation pharmaceutique de cette composition. La composition topique de cette invention présente d'excellentes propriétés de pénétration cutanée et de stabilité et se révèle efficace dans le traitement de dermatoses prurigineuses ou irritantes.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RS, RU, SC, SD, SE, SG, SK, SL, SM, SV, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Korean (KO)